- Capacitively Coupled Plasma
최찬혁
CHOI CHAN HYUK
- Isotropic Plasma Etching
박우창
PARK WOO CHANG
- Capacitively Coupled Plasma
이준수
LEE JUN SOO
- Inductively Coupled Plasma
정준원
JEONG JUN WON
- Capacitively Coupled Plasma
사또 아키히데
SATO AKIHIDE
- Atomic Layer Etching
하대연
HA DAE YEON
- 삼성전자 (SSIT), 반도체연구소
김성택
KIM SUNG TAEK
- 2D Materials
김시연
KIM SI YEON
- Inductively Coupled Plasma
김성현
KIM SUNG HYUN
- Isotropic Plasma Etching
양수정
YANG SU JEONG
- 2D Materials
오가희
OH GA HEE
- Inductively Coupled Plasma
전영우
JEON YOUNG WOO
- Isotropic Plasma Etching
윤은석
YOON EUN SEOK
- Capacitively Coupled Plasma
최세영
CHOI SE YOUNG
- Inductively Coupled Plasma
장현봉
JANG HYUN BONG
- VHF Atomic Layer Deposition
고다훈
KO DA HUN
- Inductively Coupled Plasma
강성훈
KANG SEONG HUN
- Inductively Coupled Plasma
유희정
YU HUI JEONG
- Capacitively Coupled Plasma
이민선
LEE MIN SEON
- 2D Materials
이서영
LEE SEO YOUNG
- Capacitively Coupled Plasma
전호림
JEON HO RIM