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[2023]
Characteristics of high aspect ratio SiO2 etching using C4H2F6 isomers
Applied Surface Science 639, 158190
Hye Joo Lee, Hyun Woo Tak, Seong Bae Kim, Seul Ki Kim, Tae Hyun Park, Ji Yeun Kim, Dain Sung, Wonseok Lee, Seung Bae Lee, Keunsuk Kim, Byeong Ok Cho, Young Lea Kim, Ki Chan Lee, Dong Woo Kim, Geun Young Yeom
[2023]
Three-Dimensional Surface Treatment of MoS2 Using BCl3 Plasma-Derived Radicals
ACS Applied Materials & Interfaces
Heesoo Lee, Hoijoon Kim, Kihyun Kim, Kwangsik Jeong, Mirine Leem, Seunghyun Park, Jieun Kang, Geunyoung Yeom, Hyoungsub Kim
[2023]
Etched characteristics of nanoscale TiO2 using C4F8-based and BCl3-based gases
Materials Science in Semiconductor Processing 164, 107617
Jong Woo Hong, Yeon Hee Kim, Hee Ju Kim, Hyun Woo Tak, Soo Nam Goong, Seong Bae Kim, Ki Deok Bae, Jeong Yub Lee, Hae Soo Bae, Geun Young Yeom, Dong Woo Kim
[2023]
Surface hardening of extreme ultraviolet (EUV) photoresist by CS2 plasma for highly selective and low damage patterning
Applied Surface Science 629, 157439
Won Jun Chang, Hee Ju Kim, Geun Young Yeom
[2023]
Highly selective etching of SiNx over SiO2 using ClF3/Cl2 remote plasma
Nanotechnology 34 (46), 465302
Seong Jae Yoo, Ji Eun Kang, You Jin Ji, Hyun Woo Tak, Byeong Ok Cho, Young Lae Kim, Ki Chan Lee, Jin Sung Chun, Yongil Kim, Dong Woo Kim, Geun Young Yeom
[2023]
Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction
Materials 16 (16),5624
Minsu Choi, Youngseok Lee, Yebin You, Chulhee Cho, Wonnyoung Jeong, Inho Seong, Byeongyeop Choi, Sijun Kim, Youbin Seol, Shinjae You, Geun Young Yeom
[2023]
Selective isotropic etching of SiO2 over Si3N4 using NF3/H2 remote plasma and methanol vapor
Scientific Reports 13 (1), 11599
Hong Seong Gil, Doo San Kim, Yun Jong Jang, Dea Whan Kim, Hea In Kwon, Gyoung Chan Kim, Dong Woo Kim, Geun Young Yeom
[2023]
Indium tin oxide etch characteristics using CxH2x+ 2 (x= 1, 2, 3)/Ar
Materials Science in Semiconductor Processing 160, 107395
Jong Woo Hong, Hyun Min Cho, Yu Gwang Jeong, Yun Jong Yeo, Ji Eun Kang, Hee Ju Kim, Hyun Woo Tak, Geun Young Yeom, Dong Woo Kim
[2023]
Asynchronously Pulsed Plasma for High Aspect Ratio Nanoscale Si Trench Etch Process
ACS Applied Nano Materials
Hee Ju Kim, Geun Young Yeom
[2023]
Plasma Enhanced Atomic Layer Deposition of Silicon Nitride for Two Different Aminosilane Precursors Using Very High Frequency (162 MHz) Plasma Source
ACS Applied Materials & Interfaces
You Jin Ji, Hae In Kim, Seung Yup Choi, Ji Eun Kang, Albert Rogers Ellingboe, Haripin Chandra, Chang-Won Lee, Geun Young Yeom
[2023]
Effect of various pulse plasma techniques on TiO2 etching for metalens formation
Vacuum 212, 111978
Jong Woo Hong, Yeon Hee Kim, Hee Ju Kim, Hyun Woo Tak, Ki Deok Bae, Jeong Yub Lee, Hae Soo Bae, Yong Su Kim, Geun Young Yeom
[2023]
Study on etch characteristics of magnetic tunnel junction materials using rf-biased H2/NH3 reactive ion beam
Journal of Vacuum Science & Technology A 41 (3)
Ye Eun Kim, Doo San Kim, Yun Jong Jang, Hong Seong Gil, Ho Seop Jeon, Jong Woo Hong, In Ho Kim, Cheol Kim, Jeong-Heon Park, Geun Young Yeom
[2023]
High-throughput manufacturing of epitaxial membranes from a single wafer by 2D materials-based layer transfer process
Nature nanotechnology 18 (5), 464-470
Hyunseok Kim et al.
[2023]
Non-epitaxial single-crystal 2D material growth by geometric confinement
Nature 614 (7946), 88-94
Ki Seok Kim, Doyoon Lee, Celesta S Chang, Seunghwan Seo, Yaoqiao Hu, Soonyoung Cha, Hyunseok Kim, Jiho Shin, Ju-Hee Lee, Sangho Lee, Justin S Kim, Ki Hyun Kim, Jun Min Suh, Yuan Meng, Bo-In Park, Jung-Hoon Lee, Hyung-Sang Park, Hyun S Kum, Moon-Ho Jo, Geun Young Yeom, Kyeongjae Cho, Jin-Hong Park, Sang-Hoon Bae, Jeehwan Kim
[2022]
Atomic layer etching of Sn by surface modification with H and Cl radicals
Nanotechnology 34 (3), 035301
Doo San Kim, Yun Jong Jang, Ye Eun Kim, Hong Seong Gil, Byeong Hwa Jeong, Geun Young Yeom
[2022]
Low temperature silicon nitride grown by very high frequency (VHF, 162MHz) plasma enhanced atomic layer deposition with floating multi-tile electrode
Surfaces and Interfaces 33, 102219
You Jin Ji, Hae In Kim, Ki Hyun Kim, Ji Eun Kang, Doo San Kim, Ki Seok Kim, AR Ellingboe, Dong Woo Kim, Geun Young Yeom
[2022]
Atomic Layer Engineering of TMDs by Modulation of Top Chalcogen Atoms: For Electrical Contact and Chemical Doping
ACS Applied Electronic Materials 4 (8), 3794-3800
Ki Seok Kim, Ki Hyun Kim, Ji Eun Kang, Ju-Hee Lee, You Jin Ji, Geun Young Yeom
[2022]
Etch Characteristics of Low-K Materials Using CF3I/C4F8/Ar/O2 Inductively Coupled Plasmas
Science of Advanced Materials 14(7), 1258-1264
Jong Woo Hong, Hyun Woo Tak, Young Hun Choi, Hee Jung Kim, Dong Woo Kim, Geun Young Yeom
[2022]
Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide
Applied Surface Science 154050
Hyun Woo Tak, Hye Joo Lee, Long Wen, Byung Jin Kang, Dain Sung, Jeong Woon Bae, Dong Woo Kim, Wonseok Lee, Seung Bae Lee, Keunsuk Kim, Byeong Ok Cho, Young Lea Kim, Han Dock Song, Geun Young Yeom
[2022]
Effect of Different Pulse Modes during Cl2/Ar Inductively Coupled Plasma Etching on the Characteristics of Nanoscale Silicon Trench Formation
Applied Surface Science 153604
Hee Ju Kim, Long Wen, Doo San Kim, Ki Hyun Kim, Jong Woo Hong, Won Jun Jang, Soo Namgoong, Dong Woo Kim, Geun Young Yeom
[2022]
Multiplication of freestanding semiconductor membranes from a single wafer by advanced remote epitaxy
arXiv:2204.08002
Hyunseok Kim et al.
[2022]
Selective etching of silicon nitride over silicon oxide using ClF3/H2 remote plasma
Scientific reports 12, 1-9
Won Oh Lee, Ki Hyun Kim, Doo San Kim, You Jin Ji, Ji Eun Kang, Hyun Woo Tak, Jin Woo Park, Han Dock Song, Ki Seok Kim, Byeong Ok Cho, Young Lae Kim, Geun Young Yeom
[2022]
Atomic layer-by-layer etching of graphene directly grown on SrTiO3 substrates for high-yield remote epitaxy and lift-off
APL Materials 10, 041105
Ki Seok Kim, Ji Eun Kang, Peng Chen, Sung Kyu Kim, Jong Ho Ji, Geun Young Yeom, Jee Hwan Kim, Hyun S Kum
[2022]
Investigation of SiO2 Etch Characteristics by C6F6/Ar/O2 Plasmas Generated Using Inductively Coupled Plasma and Capacitively Coupled Plasma
Materials 15, 1300
Da In Sung, Long Wen, Hyun Woo Tak, Hye Joo Lee, Dong Woo Kim and Geun Young Yeom
[2022]
Deposition of Very-Low-Hydrogen-Containing Silicon at a Low Temperature Using Very-High-Frequency (162 MHz) SiH4 Plasma
Micromachines 13, 173
Ki Seok Kim, You Jin Ji , Ki Hyun Kim , Ji Eun Kang , Albert Rogers Ellingboe and Geun Young Yeom
[2022]
Radical flux control in reactive ion beam etching (RIBE) by dual exhaust system
Applied Surface Science 571,151311
Doo San Kim, Yun Jong Jang, Ye Eun Kim, Hong Seong Gil, Hee Ju Kim, You Jin Ji, Hyung Yong Kim, In Ho Kim, Myoung Kwan Chae, Jong Chul Park, Geun Young Yeom
[2021]
Silicon nitride deposited by laser assisted plasma enhanced chemical vapor deposition for next generation organic electronic devices
Appl. Surf. Sci. 148313
Ki Hyun Kim, Ki Seok Kim, You Jin Ji, Ji Eun Kang, Geun Young Yeom
[2021]
Radio Frequency Induction Welding of Silver Nanowire Networks for Transparent Heat Films
Materials, 14, 16, 4448
Jisoo Oh, Long Wen, Hyunwoo Tak, Heeju Kim, Gyowun Kim, Jongwoo Hong, Wonjun Chang, Dongwoo Kim, Geunyoung Yeom
[2021]
Universal vertical standing of block copolymer microdomains enabled by a gradient block
Journal of Materials Chemistry C, 9, 39, 14021-14029
Seung Won Song, Yoon Hyung Hur, Yemin Park, Eugene N Cho, Hyeuk Jin Han, Hanhwi Jang, Jisoo Oh, Geunyoung Yeom, Jisun Lee, Kwang-Sub Yoon, Chang-Min Park, Insung Kim, YongJoo Kim, Yeon Sik Jung
[2021]
Characteristics of Cobalt Thin Films Deposited by Very High Frequency Plasma Enhanced Atomic Layer Deposition (60 and 100 MHz) Using Cobaltocene (Co (Cp) 2)/NH3
Journal of Nanoscience and Nanotechnology, 21, 3, 1826-1832
Won Gyun Yeom, Chang Hoon Song, Chul Hee Cho, Shin Jae You, Geun Young Yeom
[2021]
Study on Hydrogen-Based Reactive Ion Etching of Ovonic Threshold Switch (OTS) Materials for Phase Change Memory Devices
ECS Transactions, 102, 2, 39
Doo San Kim, You Jung Gill, Yun Jong Jang, Ye Eun Kim, Geun Young Yeom
[2021]
Impact of 2D–3D Heterointerface on Remote Epitaxial Interaction through Graphene
ACS nano
Hyunseok Kim, Kuangye Lu, Yunpeng Liu, Hyun S Kum, Ki Seok Kim, Kuan Qiao, Sang-Hoon Bae, Sangho Lee, You Jin Ji, Ki Hyun Kim, Hanjong Paik, Saien Xie, Heechang Shin, Chanyeol Choi, June Hyuk Lee, Chengye Dong, Joshua A Robinson, Jae-Hyun Lee, Jong-Hyun Ahn, Geun Young Yeom, Darrell G Schlom, Jeehwan Kim
[2021]
Performance of vertical type deep UV light-emitting diodes depending on the Ga-face n-contact hole density
Applied Physics Letters,118,23, 231102
Youn Joon Sung, Dong-Woo Kim, Geun Young Yeom, Kyu Sang Kim
[2021]
Improved Electrical and Optical Properties of Ultra-Thin Tin Doped Indium Oxide (ITO) Thin Films by a 3-Dimensionally Confined Magnetron Sputtering Source
Science of Advanced Materials, 13, 8, 1498-1505
Long Wen, Bibhuti-B Sahu, Jeon-Geon Han, Geun-Young Yeom
[2021]
Origin of operating voltage increase in deep UV light-emitting diodes with ITO/Al reflector
Japanese Journal of Applied Physics, 60, 11, 112002
Youn Joon Sung, Dong-Woo Kim, Geun Young Yeom, Kyu Sang Kim
[2021]
Cyclic etching of silicon oxide using NF3/H2 remote plasma and NH3 gas flow
Plasma Processes and Polymers, 18, 11, 2100063
You Jung Gill, Doo San Kim, Hong Seong Gil, Ki Hyun Kim, Yun Jong Jang, Ye Eun Kim, Geun Young Yeom
[2021]
Room temperature deposition of very thin and flexible crystalline ITO thin film using 3-D facing-magnetron sputtering plasma source
Vacuum, 193, 110520
Long Wen, Bibhuti B Sahu, Geun Y Yeom, Jeon G Han
[2021]
Reduction of EUV resist damage by neutral beam etching
Nanotechnology
Gyo Wun Kim, Won Jun Chang, Ji Eun Kang, Hee Ju Kim, Geun Young Yeom
[2020]
Etch characteristics of magnetic tunnel junction materials using H2/NH3 reactive ion beam
Nanotechnology 32, 5
Ju Eun Kim, Doo San Kim, You Jung Gill, Yun Jong Jang, Ye Eun Kim, Hanna Cho, Bok-Yeon Won, Oik Kwon, Kukhan Yoon, Jin-Young Choi, Jea-Gun Park, and Geun Young Yeom
[2020]
Characteristics of silicon nitride deposited by very high frequency (162 MHz)-plasma enhanced atomic layer deposition using bis(diethylamino)silane
Nanotechnology 32, 7
Ji Young Byun, You Jin Ji, Ki Hyun Kim, Ki Seok Kim, Hyun Woo Tak, Albert Rogers Ellingboe, and Geun Young Yeom
[2020]
Characteristics of Plasma-activated Dielectric Film Surfaces for Direct Wafer Bonding
IEEE 2025-2032
Seongmin Son, Junhong Min, Eunsuk Jung, Hoechul Kim, Taeyoung Kim, Hyungjun Jeon, Jinnam Kim, Seokho Kim, Kwangjin Moon, Hoonjoo Na, Kihyun Hwang, and Geun Young Yeom
[2020]
Characteristics of W thin film deposited by indirect inductively coupled plasma assisted sputtering
Mater. Express 10, 6
Tae Hyung Kim, Kyong Nam Kim, Dong Woo Kim, and Geun Young Yeom
[2020]
A comparative study of Cx(X = 4, 5, 7)F8 plasmas for dry etch processing
Mater. Express 10, 6
Da In Sung, Hyun Woo Tak, Dong Woo Kim, and Geun Young Yeom
[2020]
Etch characteristics of nanoscale ultra low-k dielectric using C3H2F6
Mater. Express 10, 6
Hyun Woo Tak, Jun Ki Jang, Dain Sung, Doo San Kim, Dong Woo Kim, and Geun Young Yeom
[2020]
Anisotropic/Isotropic Atomic Layer Etching of Metals
Appl. Sci. Converg. Technol. 29(3): 41-49
Doo San Kim, Ju Eun Kim, You Jung Gill, Yun Jong Jang, Ye Eun Kim, Kyong Nam Kim, Geun Young Yeom, and Dong Woo Kim
[2020]
Study on plasma characteristics and gas analysis before and after recovery using liquid-fluorocarbon precursor
Appl. Surf. Sci. 532, 147358
Junyoung Park, Byoungmoon Oh, Kyongnam Kim, Dain Sung, Geunyoung Yeom
[2020]
Reactive ion etching of an ovonic threshold switch (OTS) material using hydrogen-based plasmas for non-volatile phase change memories
RSC Adv. 10, 36141
Doo San Kim, Ju Eun Kim, You Jung Gill, Jin Woo Park, Yun Jong Jang, Ye Eun Kim, Hyejin Choi, Oik Kwon and Geun Young Yeom
[2020]
Plasma Induced Damage Reduction of Ultra Low-k Dielectric by Using Source Pulsed Plasma Etching for Next BEOL Interconnect Manufacturing
IEEE Trans. Semicond. Manuf. 33, 2
Jun Ki Jang, Hyun Woo Tak, Ye Ji Shin, Doo San Kim, and Geun Young Yeom
[2020]
Direct nanoparticle coating using atmospheric plasma jet
J. Nanopart. Res. 22, 136
Mu Kyeom Mun, Yun Jong Jang, Dong Woo Kim and Geun Young Yeom
[2020]
Etch characteristics of Si and TiO2 nanostructures using pulse biased inductively coupled plasmas
Nanotechnology 31, 265302
Soo-Gang Kim, Kyung-Chae Yang, Ye-Ji Shin, Kyong-Nam Kim, Dong-Woo Kim, Jeong Yub Lee, YeonHee Kim and Geun-Young Yeom
[2020]
Invisible Silver Nanomesh Skin Electrode via Mechanical Press Welding
Nanomaterials 10, 633
Ji Soo Oh, Jong Sik Oh and Geun Young Yeom
[2020]
Wafer-Scale and Low-Temperature Growth of 1T-WS2 Film for Efficient and Stable Hydrogen Evolution Reaction
Small 16, 1905000
Hyeong-U Kim, Vinit Kanade, Mansu Kim, Ki Seok Kim, Byeong-Seon An, Hyunho Seok, Hocheon Yoo, Lindsay E.Chaney, Seung-Il Kim, Cheol-Woong Yang, Geun Yong Yeom, Dongmok Whang, Jae-Hyun Lee, and Taesung Kim
[2019]
Low-temperature wafer-scale growth of MoS2-graphene heterostructures
Appl. Surf. Sci. 470, 129-134
Hyeong-U Kim, Mansu Kim, Yinhua Jin, Yuhwan Hyeon, Ki Seok Kim, Byeong-Seon An, Cheol-Woong Yang, Vinit Kanade, Ji-Yun Moon, Geun Yong Yeom, Dongmok Whanga, Jae-Hyun Leec, Taesung Kima
[2019]
Enhancing the light extraction of AlGaN-based vertical type deep-ultraviolet light-emitting-diodes with an internal reflector
Appl. Phys. Express 12, 122011
Youn Joon Sung, Young-Gyeong Lee, Hwankyo Kim, Hyun-Soo Lim, O-Min Kwon, Sunghan Choi, Yong-Tae Moon, Rak-Jun Choi, Myung-Hoon Jung, Jeong-Tak Oh, Dong Woo Kim, and Geun Young Yeom
[2019]
Ultrasensitive MoS2 photodetector by serial nanobridge multi-heterojunction
Nat. Commun. 10, 4701
Ki Seok Kim, You Jin Ji, Ki Hyun Kim, Seunghyuk Choi, Dong-Ho Kang, Keun Heo, Seongjae Cho, Soonmin Yim, Sungjoo Lee, Jin-Hong Park, Yeon Sik Jung and Geun Young Yeom
[2019]
A Brief Review of Plasma Enhanced Atomic Layer Deposition of Si3N4
Appl. Sci. Converg. Technol. 28, 142−147
You Jin Ji, Ki Seok Kim, Ki Hyun Kim, Ji Young Byun, and Geun Young Yeom
[2019]
Light extraction enhancement of AlGaN-based vertical type deep-ultraviolet light-emitting-diodes by using highly reflective ITO/Al electrode and surface roughening
Opt. Express 27, 29930
YOUN JOON SUNG, MIN-SUNG KIM, HWANKYO KIM, SUNGHAN CHOI, YOUNG HOON KIM, MYUNG-HOON JUNG, RAK-JUN CHOI, YONG-TAE MOON, JEONG-TAK OH, HWAN-HEE JEONG, AND GEUN YOUNG YEOM
[2019]
Etch Damage Reduction of Ultra Low-k Dielectric by Using Pulsed Plasmas
ECS Trans. 89, 79−86
Jun Ki Jang, Hyun Woo Tak, Kyung Chae Yang, Ye Ji Shin, Jae Young Hyeon, Min Guk Kang, Jeong Hoon Ahn and Geun Young Yeom
[2019]
Plasma press for improved adhesion between flexible polymer substrate and inorganic material
Int. J. Adhes. Adhes. 11, 59−65
Mu Kyeom Mun, Doo San Kim, Dong Woo Kim, Geun Young Yeom
[2019]
The device level modulation of carrier transport in a 2D WSe2 field effect transistor via a plasma treatment
Nanoscale 11, 17368
Inyong Moon, Sungwon Lee, Myeongjin Lee, Changsik Kim, Daehee Seol, Yunseok Kim, Ki Hyun Kim, Geun Young Yeom, James T. Teherani, James Hone and Won Jong Yoo
[2019]
Effects of superimposed dual-frequency (13.56/2 MHz) inductively coupled plasma source on the uniformity of Ar/CF4 plasma
Vacuum 168, 108802
Kyung Chae Yang, Ye Ji Shin, Hyun Woo Tak, Wonseok Lee, Seung Bae Lee and Geun Young Yeom
[2019]
Etch Damages of Ovonic Threshold Switch (OTS) Material by Halogen Gas Based-Inductively Coupled Plasmas
ECS J. Solid State Sci. Technol. 8, 341-345
JinWoo Park, Doo San Kim, Won Oh Lee, Ju Eun Kim, HyeJin Choi, OIk Kwon, SeungPil Chung, and Geun Young Yeom
[2019]
Anisotropic atomic layer etching of W using fluorine radicals/oxygen ion beam
Plasma Processes and Polymers, 16, 9
Doo San Kim, Ju Eun Kim, Won Oh Lee, Jin Woo Park, You Jung Gill, Byeong Hwa Jeong, Geun Young Yeom
[2019]
Plasma functional polymerization of dopamine using atmospheric pressure plasma and a dopamine solution mist
RSC Adv. 9, 12814
Mu Kyeom Mun, Yun Jong Jang, Ju Eun Kim, Geun Young Yeom and Dong Woo Kim
[2019]
Flexible Molybdenum Disulfide (MoS2) Atomic Layers for Wearable Electronics and Optoelectronics
ACS Appl. Mater. Interfaces 11, 11061−11105
Eric Singh, Pragya Singh, Ki Seok Kim, Geun Young Yeom, and Hari Singh Nalwa
[2019]
Highly oxidation-resistant silver nanowires by CxFy polymers using plasma treatment
J. Nanotechnol. 30, 28
Kyung Chae Yang, Da In Sung, Ye Ji Shin and Geun Young Yeom
[2018]
Layer Control of 2D-MoS2 by Atomic Layer Etching and Its Device Characteristics
ECS Transactions. 86, 69-74
Ki Seok Kim, Ki Hyun Kim, Yoo Jin Ji and Geun Young Yeom
[2018]
Hierarchical nanostructures of nitrogen-doped molybdenum sulphide for supercapacitors
RSC Advances. 8, 39749
Chaitanya Kanade, Sudhir Arbuj, Kaluram Kanade, Ki Seok Kim, Geun Young Yeom, Taesung Kim and Bharat Kale
[2018]
Low-temperature wafer-scale growth of MoS2-graphene heterostructures
Applied Surface Science. 470, 129
Hyeong-U Kim, Mansu Kim, Yinhua Jin, Yuhwan Hyeon, Ki Seok Kim, Byeong-Seon An, Cheol-Woong Yang, Vinit Kanade, Ji-Yun Moon, Geun Yong Yeoma, Dongmok Whang, Jae-Hyun Lee and Taesung Kim
[2018]
Self-selective fine metal line coating using surface energy differences
Microelectronic Engineering. 187–188, 33
Mu Kyeom Mun, Doo San Kim, Geun Young Yeom and DongWoo Kim
[2018]
Plasma press for improved adhesion between flexible polymer substrate and inorganic material
International Journal of Adhesion and Adhesives. 89, 59
Mu Kyeom Mun, Doo San Kim, Dong Woo Kim and Geun Young Yeom
[2018]
Properties of an Internal U-Shaped Inductively Coupled Plasma Source Operated by Superimposed Dual Frequency
IEEE Transactions on plasma science. 46, 3159
Do Han Kim, Tae Hyung Kim, Soo Jung Lee, Won Oh Lee, Kyong Nam Kim, and Geun Young Yeom
[2018]
Residual stress control of Cu film deposited using a pulsed direct current magnetron sputtering
Thin Solid Films. 660, 601
Tae Hyung Kim, Soo Jung Lee, Do Han Kim, Dong Woo Kim, Jeong Woon Bae, Kyong Nam Kim, Yong Mo Kim, Geun Young Yeom
[2018]
SiO2 etch characteristics and environmental impact of Ar/C3F6O chemistry
Journal of Vacuum Science & Technology A. 36, 061306
Ho Seok Lee, Kyung Chae Yang, Soo Gang Kim, Ye Ji Shin, Dae Woong Suh, Han Dock Song, Nae Eung Lee and Geun Young Yeom
[2018]
Efficient metallic nanowire welding using the Eddy current method
Nanotechnology. 30, 065708
Ji Soo Oh, Jong Sik Oh, Tae Hyung Kim and Geun Young Yeom
[2018]
In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
J. Phys. D: Appl. Phys. 51, 445201
Jin Woo Park, Myeong Gyoon Chae, Doo San Kim, Won Oh Lee, Han Dock Song, Changhwan Choi and Geun Young Yeom
[2018]
Atomic layer etching of chrome using ion beams
Nanotechnology. 30, 085303
Jin Woo Park, Doo San Kim, Won Oh Lee, Ju Eun Kim and Geun Young Yeom
[2017]
Highly uniform wafer-scale synthesis of α-MoO3 by plasma enhanced chemical vapor deposition
Nanotechnology 28, 175601
Hyeong-U Kim, Juhyun Son, Atul Kulkarni, Chisung Ahn, Ki Seok Kim, Dongjoo Shin, Geun Yong Yeom and Taesung Kim
[2017]
Fabrication of Stretchable Transparent Electrodes
Applied Science and Convergence Technology Vol. 26, No. 6
Jong Sik Oh and Geun Young Yeom
[2017]
Nanoparticles Synthesis and Modification using Solution Plasma Process
Applied Science and Convergence Technology Vol. 26, No. 6
Mu Kyeom Mun, Won Oh Lee, Jin Woo Park, Doo San Kim, Geun Young Yeom, and Dong Woo Kim
[2017]
Fabrication of High-Performance Graphene Nanoplatelet-based Transparent Electrode via Self-Interlayer-Exfoliation Contro
Nanoscale Vol. x, No. x
Jong Sik Oh, Ji Soo Oh, Da In Sung and Geun Young Yeom
[2017]
Properties of IGZO Film Deposited by Ar/O2 Inductively Coupled Plasma Assisted DC Magnetron Sputtering
Science of Advanced Materials Vol. 9, No. 7
Chul Hee Lee, Tae Hyung Kim, Seung Min Lee, Jeong Wun Bae, Kyong Nam Kim, and Geun Young Yeom
[2017]
Self-selective fine metal line coating using surface energy differences
Microelectronic engineering Vol. x, No. 187
Mu Kyeom Mun, Doo San Kim, Geun Young Yeom, DongWoo Kim
[2017]
Self-Assembled Layer (SAL)-Based Doping on Black Phosphorus (BP) Transistor and Photodetector
ACS photonics Vol. 4, No. 7
Dong-Ho Kang, Min Hwan Jeon, Sung Kyu Jang, Woo-Young Choi, Kyong Nam Kim, Jinok Kim, Sungjoo Lee, Geun Young Yeom, and Jin-Hong Park
[2017]
Improved Etch Characteristics of Magnetic Tunneling Junction Materials by Using Helium
ECS journal of solid state science and technology Vol. 6, No. 9
Sungwoo Park, Kyungchae Yang, Hoseok Lee, Dongwoo Kim, Jongung Baek, Taehun Shim,c Jeagun Park,c and Geunyoung Yeom
[2017]
Nanoscale Spin-Transfer Torque MRAM Etching Using Various Gases
Journal of The Electrochemical Society Vol. 77, No. 3
K. C. Yang, S. W. Park, H. S. Lee, and G. Y. Yeom
[2017]
Highly uniform wafer-scale synthesis of alpha-MoO3 by plasma enhanced chemical vapor deposition
Nanotechnology Vol. 28, No. 17
Hyeong-U Kim, Juhyun Son, Atul Kulkarni, Chisung Ahn, Ki Seok Kim, Dongjoo Shin, Geun Yong Yeom and Taesung Kim
[2017]
Hydrophobic Surface Treatment of Carbon Black anoparticles in Isopropyl Alcohol Solution Using He/SF6 Atmospheric Plasma Jet
Journal of Nanoscience And Nanotechnology Vol. 17
Mu Kyeom Mun, Lee Won Ho, Jin Woo Park, Doo San Kim, Geun Young Yeom, and Dong Woo Kim
[2017]
Two-dimensional transition metal dichalcogenidebased counter electrodes for dye-sensitized solar cells
RSC Advances Vol. 7, No. 45
Eric Singh, Ki Seok Kim, Geun Young Yeom and Hari Singh Nalwa
[2017]
Silicon Nitride Deposition for Flexible Organic Electronic Devices by VHF (162 MHz)-PECVD Using a Multi-Tile Push-Pull Plasma Source
Scientific Reports Vol. 7, No. x
Ki Seok Kim, Ki Hyun Kim, You Jin Ji, Jin Woo Park, Jae Hee Shin, Albert Rogers Ellingboe & Geun Young Yeom
[2017]
Atomic layer etching of graphene through controlled ion beam for graphene-based electronics
Scientific Reports Vol. 7, No. x
Ki Seok Kim, You Jin Ji, Yeonsig Nam, Ki Hyun Kim, Eric Singh, Jin Yong Lee & Geun Young Yeom
[2017]
Layer-controlled thinning of black phosphorus by an Ar ion beam
J. Mater. Chem. C Vol. 5, No. 41
Jin Woo Park, Sung Kyu Jang, Dong Ho Kang, Doo San Kim, Min Hwan Jeon, Won Oh Lee, Ki Seok Kim, Sung Joo Lee, Jin-Hong Park, Kyong Nam Kim and Geun Young Yeom
[2017]
Photocatalytic Effect of Ag/TiO2 Nanotubes Fabricated Using 40 nm-Scale BCP Lithography
Nanosci. Nanotechnol. Lett. Vol. 9, No. 1
Da In Sung, Hyun Gu Kim, Seung Keun Cha, Dong Hyun Kim, Han-Bo-Ram Lee, Sang Ouk Kim, Dong Woo Kim and Geun Young Yeom
[2017]
Effect of Structure and Material Variation of Focus Ring for Enhanced Etch Resistance
Nanosci. Nanotechnol. Lett. Vol. 9, No. 1
Kyung Chae Yang, Sung Woo Park, Ho Seok Lee, Dong Woo Kim, and Geun Young Yeom
[2017]
Atomic layer etching of InGaAs by controlled ion beam
J. Phys. D: Appl. Phys. 50, 254007
Jin Woo Park, Doo San Kim, Mu Kyeom Mun, Won Oh Lee, Ki Seok Kim and Geun Young Yeom
[2017]
The enhancement of Hall mobility and conductivity of CVD graphene through radical doping and vacuum annealing
RSC Adv., 7, 16104–16108
Viet Phuong Pham, Anurag Mishra and Geun Young Yeom
[2017]
Atomically Thin-Layered Molybdenum Disulfide (MoS2) for Bulk-Heterojunction Solar Cells
ACS Appl. Mater. Interfaces 9, 3223−3245
Eric Singh, Ki Seok Kim, Geun Young Yeom and Hari Singh Nalwa
[2016]
Low Energy BCl3 Plasma Doping of Few-Layer Graphene
Sci. Adv. Mater. 8, 4
Viet Phuong Pham, Doo San Kim, Ki Seok Kim, Jin Woo Park, Kyung Chae Yang, Se Han Lee, Geun Young Yeom and Kyong Nam Kim
[2016]
Thickness-dependent growth orientation of F-doped ZnO films formed by atomic layer deposition
J. Vac. Sci. Technol. A 34, 1
Kyung-Mun Kang, Yong-June Choi, Geun Young Yeom, and Hyung-Ho Park
[2016]
Etch Characteristics of SiO2 Using Pulsed Triple-Frequency for Ar/C4F6/O2 Capacitive Coupled Plasmas
J. Nanosci. Nanotechnol. 16, 11
M. H. Jeon, Jin Woo Park, T. H. Kim, D. H. Yun, K. N. Kim, and G. Y. Yeom
[2016]
Low Global Warming Potential Alternative Gases for Plasma Chamber Cleaning
Science of Advanced Materials, 8, 12
Yang, Kyung-Chae, Park, Sung-Woo and Yeom, Geun-Young
[2016]
Improved Adhesion Between Copper and Prepreg Using Plasma Press Process
Science of Advanced Materials, 8, 10
Kim, Doo-San, Mun, Mu-Kyeom and Yeom, Geun-Young
[2016]
Electron density modulation in a pulsed dual-frequency (2/13.56 MHz) dual-antenna inductively coupled plasma discharge
J. Vac. Sci. Technol. A 34, 5
Nishant Sirse, Anurag Mishra, Geun Y. Yeom, Albert R. Ellingboe
[2016]
Improvement of a block co-polymer (PS-b-PMMA)-masked silicon etch profile using a neutral beam
Nanotechnology 27 384002
Deok Hyun Yun, Jin Woo Park, Hwa Sung Kim, Jeong Ho Mun, Sang Ouk Kim, Kyong Nam Kim and Geun Young Yeom
[2016]
Atmospheric pressure plasmas for surface modification of flexible and printed electronic devices: A review
Thin Solid Films 598, 315–334
Kyong Nam Kim, Seung Min Lee, Anurag Mishra, Geun Young Yeom
[2016]
Fabrication of 50 nm scale Pt nanostructures by block copolymer (BCP) and its characteristics of surface-enhanced Raman scattering (SERS)
RSC Adv. 6, 70756–70762
Jae Hee Shin, Hyun Gu Kim, Gwang Min Baek, Reehyang Kim, Suwan Jeon, Jeong Ho Mun, Han-Bo-Ram Lee, Yeon Sik Jung, Sang Ouk Kim, Kyoung Nam Kim and Geun Young Yeom
[2016]
Size-tunable synthesis of monolayer MoS 2 nanoparticles and their applications in non-volatile memory devices
Nanoscale 8, 16995–17003
Jaeho Jeon, Jinhee Lee, Gwangwe Yoo, Jin-Hong Park, Geun Young Yeom, Yun Hee Jang and Sungjoo Lee
[2016]
Evaluation of a ferroelectric tunnel junction by ultraviolet–visible absorption using a removable liquid electrode
Nanotechnology 27, 215704
Hong-Sub Lee, Kyung-Mun Kang, Geun Young Yeom and Hyung-Ho Park
[2016]
Simple Fabrication of Pillar Silicon Nanostructures by a Contact Block Copolymer Technique
J. Nanosci. Nanotechnol. 16, 11
Hwa Sung Kim, Jin Woo Park, Deok Hyun Yun, Doo San Kim, and Geun Young Yeom
[2016]
Very high frequency plasma reactant for atomic layer deposition
Applied Surface Science 387, 109–117
Il-Kwon Oh, Gilsang Yoo, Chang Mo Yoon, Tae Hyung Kim, Geun Young Yeom,Kangsik Kim, Zonghoon Lee, Hanearl Jung, Chang Wan Lee, Hyungjun Kim,Han-Bo-Ram Lee
[2016]
Purification of Graphene Flakes by Using Radio-Frequency Thermal Ar Plasma
Science of Advanced Materials, 8, 4
Oh, Jong Sik; Oh, Ji Soo; Shin, Myoung Sun; Lee, Kyu Hang; Kim, Jung Gil; Choi, Sung Yong; Kim, Seong In; Lee, Se Han; Yeom, Geun Young; Kim, Kyong Nam
[2016]
Transient plasma potential in pulsed dual frequency inductively coupled plasmas and effect of substrate biasing
AIP Advances 6, 095101
Anurag Mishra and Geun Young Yeom
[2016]
Recent Advances in Doping of Molybdenum Disulfide:Industrial Applications and Future Prospects
Adv. Mater. 28, 9024–9059
Viet Phuong Pham and Geun Young Yeom
[2016]
Etching of Magnetic Tunnel Junction Materials Using Reactive Ion Beam
J. Nanosci. Nanotechnol. 16, 11
Min Hwan Jeon, Kyung Chae Yang, Jin Woo Park, Deok Hyun Yun, Kyong Nam Kim, and Geun Young Yeom
[2016]
High-Performance 2D Rhenium Disulfi de (ReS2) Transistors and Photodetectors by Oxygen Plasma Treatment
Adv. Mater. 28, 6985–6992
Jaewoo Shim , Aely Oh , Dong-Ho Kang , Seyong Oh , Sung Kyu Jang , Jaeho Jeon , Min Hwan Jeon , Minwoo Kim , Changhwan Choi , Jaehyeong Lee , Sungjoo Lee , Geun Young Yeom , Young Jae Song , and Jin-Hong Park
[2016]
Characteristics of silicon nitride deposited by VHF (162MHz)-plasma enhanced chemical vapor deposition using a multi-tile push–pull plasma source
Journal of Physics D: Applied Physics. 49, 395201
Ki Seok Kim, Nishant Sirse, Ki Hyun Kim, Albert Rogers Ellingboe, Kyong Nam Kim and Geun Young Yeom
[2016]
Atomic layer deposition of HfO2 on graphene through controlled ion beam treatment
Appl. Phys. Lett. 108, 213102
Ki Seok Kim, Il-Kwon Oh, Hanearl Jung, Hyungjun Kim, Geun Young Yeom and Kyong Nam Kim
[2016]
A High-Performance WSe2/h-BN Photodetector using a Triphenylphosphine (PPh3)-Based n-Doping Technique
Advanced Materials 28, 24, 4824-4831
Seo-Hyeon Jo, Dong-Ho Kang, Jaewoo Shim, Jaeho Jeon, Min Hwan Jeon, Gwangwe Yoo, Jinok Kim, Jaehyeong Lee, Geun Young Yeom, Sungjoo Lee, Hyun-Yong Yu, Changhwan Choi, Jin-Hong Park
[2016]
Surface treatment process applicable to next generation graphenebased electronics
Carbon 104, 119-124
Ki Seok Kim, Hyo-Ki Hong, Hanearl Jung, Il-Kwon Oh, Zonghoon Lee, Hyungjun im, Geun Young Yeoma, Kyong Nam Kim
[2019]
Properties of tungsten thin film deposited using inductively coupled plasma assisted sputtering for next-generation interconnect metal
Thin Solid Films 674, 64-70
Soo Jung Lee, Tae Hyung Kim, Byeong-Hwa Jeong, Kyong Nam Kim, Geun Young Yeom
[2018]
Fabrication of high-performance graphene nanoplatelet-based transparent electrodes via self-interlayer-exfoliation control
Nanoscale. 10, 2351
Jong Sik Oh, Ji Soo Oh, Da In Sung and Geun Young Yeom
[2017]
Atomic Layer Etching Mechanism of MoS2 for Nanodevices
ACS Appl. Mater. Interfaces 9, 11967−11976
Ki Seok Kim, Ki Hyun Kim, Yeonsig Nam, Jaeho Jeon, Soonmin Yim, Eric Singh, Jin Yong Lee, Sung Joo Lee, Yeon Sik Jung, Geun Young Yeom and Dong Woo Kim
[2017]
Chlorine-trapped CVD bilayer graphene for resistive pressure sensor with high detection limit and high sensitivity
2D Mater. 4, 025049
Viet Phuong Pham, Minh Triet Nguyen, Jin Woo Park, Sung Soo Kwak, Dieu Hien Thi Nguyen, Mu Kyeom Mun, Hoang Danh Phan, Doo San Kim, Ki Hyun Kim, Nae-Eung Lee and Geun Young Yeom
[2016]
Influence of pulsed bias frequency on the etching of magnetic tunneling junction materials
Vacuum 127, 82-87
Kyung Chae Yang, Sung Woo Park, Min Hwan Jeon, Viet Phuong Pham, Du Yeong Lee, Tae Hun Shim, Jea Gun Park, Geun Young Yeom
[2016]
Silicon Surface Modification Using C4F8+O2 Plasma for Nano-Imprint Lithography
J Nanosci Nanotechnol. 11, 8749-55
Lee J, Efremov A, Lee J, Yeom GY, Kwon KH.
[2016]
Linewidth Control and the Improved Adhesion of Inkjet-Printed Ag on Polyimide Substrate, Textured Using Near-Atmospheric Pressure Plasmas
Plasma processes and Polymers 13, 7
Mu Kyeom Mun, Jin Woo Park, and Geun Young Yeom
[2015]
Low-temperature Synthesis of Large-Scale Molybdenum Disulfide Thin Films Directly on a Plastic Substrate Using Plasma-Enhanced Chemical Vapor Deposition
Advanced Materials 2015, 27, 5223-5229
Chisung Ahn, Jinhwan Lee, Hyeong-U Kim, Hunyoung Bark, Geun Young Yeom, Changgu Lee, and Taesung Kim
[2015]
Appilcation of Pulsed Plasmas for Nanoscale Etching of Semiconductor Device: A review
ISSN 1225-8024
Kyung Chae Yang, Sung Woo Park, Tae Ho Shin, and Geun Young Yeom.
[2015]
Chemical Vapor Deposition of Inorganic Thin Film using Atmospheric Plasma:A Review of Research Trend
ISSN 1225-8024
Kyong Nam Kim, Seung Min Lee, and Geun Young Yeom
[2015]
Measurement of nc-Si:H film uniformity and diagnosis of plasma spatial structure produced by a very high frequency, differentially powered,multi-tile plasma source
Vaccum 119 (2015) 34-46
E.Monaghan, G.Y.Yeom, A.R.Ellingboe
[2015]
Thickness-dependent growth orientation F-doped ZnO films formed by atomic layer deposition
Journal of Vaccum Science & Technology A
Kyung-Mun Kang, Yong-June Choi, Geun Young Yeom, and Hyung-Ho Park
[2015]
Etch residue removal of CoFeB using CO/NH3 reactive ion beam for spin tranfer torque-magnetic random access meomory device
Journal of Vaccum Science & Technology B
Min Hwan Jeon, Kyung Chae Yang, Jin Woo Park, Deok Hyun Yun, Kyong Nam Kim, and Geun Young Yeom
[2015]
Silicon Surface Modification Using C4F8+O2 Plasma for Nano-Imprint Lithography
Journal of Nanoscience and Nanotechnology, Vol. 15, 8749-8755, 2015Journal of Nanoscience and Nanote
Junmyung Lee, Alexander Efremov, Jaemin Lee, Geun Young Yeom, and Kwang-Ho Kwon
[2015]
Effect of Embedded RF Pulsing for Selective Etching of SiO2 in the Dual-Frequency Capacitive Coupled Plasmas
Journal of Nanoscience and Nanotechnology, Vol. 15, 8667-8673, 2015
Nam Hun Kim, Min Hwan Jeon, Tae Hyung Kim, and Geun Young Yeom
[2015]
Nano-Welding of Ag Nanowires Using Rapid Thermal Annealing for Transparent Conductive Films
Journal of Nanoscience and Nanotechnology Vol. 15, 8647-8651, 2015
Jong Sik Oh, Ji Soo Oh, Jae Hee Shin, Geun Young Yeom, and Kyong Nam Kim
[2015]
Etch Properties of Amorphous Carbon Material Using RF Pulsing in the O2/N2/CHF3 Plasma
Journal of Nanoscience and Nanotechnology, Vol 15. 8577-8583, 2015
Min Hwan Jeon, Jin Woo Park, Deok Hyun Yun, Kyung Nam Kim, and Geun Young Yeom.
[2015]
Plasma Characteristics Using Superimposed Dual Frequcncy Inductively Coupled Plasma Source for Next Generation Device Processing
Journal of Nanoscience and Nanotechnology, Vol.15, 8674-8678, 2015
Seung Min Lee, Chul Hee Lee, Tae Hyung Kim, Geun Young Yeom, and Kyong Nam Kim
[2015]
Investigation into influence of interfacial changes on the resistive switching of Pr0.7Ca0.3MnO3
Journal of Physics D Applied Physic, November 2015
Hong-sub Lee, Geun Young Yeom, and Hyung-Ho Park
[2015]
Application of Si and SiO2 Etching Mechanisms in CF4/C4F8/Ar Inductively Coupled Plasmas for Nanoscale Patterns
Journal of Nanoscience and Nanotechnology Vol. 15, 8340-8347, 2015
Junmyung Lee, Alexander Efremov, Geun Young Yeom, Nomin Lim, and Kwang-Ho Kwon
[2015]
Roughening of Polyimide Surface for Inkjet Printing by Plasma Etching Using the Polymide Masked with Polystyrene nanosphere Array
Journal of Nanoscience and Nanotechnology, Vol. 15, 8176-8182, 2015
Mu Kyeom Mun, Jin Woo Park, Jin Ho Ahn, Ki Kang Kim, and Geun Young Yeom
[2015]
Surface Modification of block Copolymer Through Surfur Containing Plasma Treatment
Journal of Nanoscience and Nanotechnology, Vol. 15, 8093-8098, 2015
Sang Wook Choi, Jae Hee Shin, Min Hwan Jeon, Geun Young Yeom, and Kyong Nam Kim
[2015]
Ferroelectric Tunnel Junction for Dense Cross-Point Arrays
Applied materials & interfaces 7, 22348-22354
Hong Sub Lee, Wooje Han, Hee Yoon Chung, Geun Young Yeom, and Hyung Ho Park
[2015]
Ion energy distributions in a pulsed dual frequency inductively coupled discharge of Ar/CF4 and effect of duty ratio
Physics of Plasmas 22, 083514 (2015)
Anurag Mishra, Jin Seok Seo, Tae Hyung Kim, and Geun Young Yeom
[2015]
Etch characteristics of magnetic tunnel junction materials using substrate heating in the pulse-biased inductively coupled plasma
Journal of Vacuum Science & Technology A 33, 061304
Min Hwan Jeon, Kyung Chae Yang, Sehan Lee, and Geun Young Yeom
[2015]
Controlled MoS2 layer etching using CF4 plasma
Nanotechnology 26, 355706
Minhwan Jeon, Chisung Ahn, HyeongU Kim, Kyong Nam Kim, and Geun Young Yeom
[2015]
Controlled Layer-by-Layer Etching of MoS2
Applied Material & Interfaces 7, 15892-15897
TaiZhe Lin, BaoTao Kang, MinHwan Jeon, GeunYoung Yeom, and KyongNam Kim
[2015]
Atmospheric presure plasmas for surface modification of flexible and printed electronic device:A review
Thin Soild Films 598, 315-334
Kyong Nam Kim, Seung Min Lee, Arurag Mishra, Geun young Yeom
[2015]
Effect of pulse phase lag in the dual synchronized pulsed capacitive coupled plasma on the etch characteristics of SiO2 by using a C4F8/Ar/O2 gas mixture
Vacuum 121, 294e299
Min Hwan Jeon, Kyung Chae Yang, Kyong Nam Kim, Geun Young Yeom
[2015]
Low damage pre-doping on CVD graphene/Cu using a chlorine inductively coupled plasma
Carbon 95, 664e671
Viet Phuong Pham, Ki Hyun Kim, Min Hwan Jeon, Se Han Lee, Kyong Nam Kim, Geun Young Yeom
[2015]
Chlorine Radical Doping of a Few Layer Graphene with Low Damage
ECS Journal of Solid State Science and Technology, 4 (6) N5095-N5097
Kyong Nam Kim, Viet Phuong Pham, and Geun Young Yeom
[2015]
Low Energy BCl3 Plasma Doping of Few-Layer Graphene
Science of Advanced Materials Vol. 7, pp. 1–7
Viet Phuong Pham, Doo San Kim, Ki Seok Kim, Jin Woo Park, Kyung Chae Yang,Se Han Lee, Geun Young Yeom
[2015]
Controllable Nondegenerate p‑Type Doping of Tungsten Diselenide by Octadecyltrichlorosilane
ACSNANO VOL.9 NO.2 1099–1107
Dong-Ho Kang, Jaewoo Shim, Sung Kyu Jang, Min Hwan Jeon, Geun Young Yeom and Jin-Hong Park
[2015]
In situ synthesis of MoS2 on a polymer based gold electrode platform and its application in electrochemical biosensing
RSC Adv., 5, 10134
Hyeong-U Kim, Hyeyoun Kim,Geun Young Yeom, Min-Ho Lee and Taesung Kim
[2015]
Wide-Range Controllable n‑Doping of Molybdenum Disulfide (MoS2) through Thermal and Optical Activation
ACSNANO VOL.9 NO.3 2368–2376
Hyung-Youl Park, Myung-Hoon Lim, Jeaho Jeon, Geun Young Yeom and Jin-Hong Park
[2015]
A comparative study of CF4/O2/Ar and C4F8/O2/Ar plasmas for dry etching applications
Thin Solid Films 579, 136–143
Inwoo Chun, Alexander Efremov, Geun Young Yeom, Kwang-Ho Kwon
[2015]
Etching mechanisms of (In, Ga, Zn)O thin films in CF4/Ar/O2 inductively coupled plasma
Journal of Vacuum Science & Technology A 33, 031601
Kwangsoo Kim, Alexander Efremov, Junmyung Lee, Kwang-Ho Kwon, and Geun Young Yeom
[2015]
Low damage etching method of low-k material with a neutral beam for interlayer dielectric of semiconductor device
Journal of Vacuum Science & Technology A 33, 021309
Seung Hyun Kang, Jong Kyu Kim, Sung Ho Lee, Jin Woo Kim, and Geun Young Yeom
[2015]
Study on contact distortion during high aspect ratio contact SiO2 etching
Journal of Vacuum Science & Technology A 33, 021303
Jong Kyu Kim, Sung Ho Lee, Sung Il Cho, and Geun Young Yeom
[2014]
Understanding time-resolved processes in atomic-layer etching of ultra-thin Al2O3 film using BCl3 and Ar neutral beam
Applied Physics Letters 105, 093104 (2014)
Young I. Jhon, Kyung S. Min, G. Y. Yeom, and Young Min Jhon
[2014]
Temporal evolution of electron density in a low pressure pulsed two-frequency 60 MHz/2 MHz) capacitively coupled plasma discharge
Plasma Sources Sci. Technol. 23 (2014) 065046 (8pp)
N Sirse, M H Jeon, G Y Yeom and A R Ellingboe
[2014]
Surface Degradation Mechanism During the Fluorine-Based Plasma Etching of a Low-k Material for Nanoscale Semiconductors
Journal of Nanoscience and Nanotechnology Vol. 14, 2014
Jong Kyu Kim, Seung Hyun Kang, Sung Il. Cho, Sung Ho Lee, Kyong Nam Kim and G. Y. Yeom
[2014]
Study on contact distortion during high aspect ratio contact SiO2 etching
Journal of Vacuum Science & Technology A 33, 021303 (2015)
Jong Kyu Kim, Sung Ho Lee, Sung Il Cho, and Geun Young Yeom
[2014]
On the Etching Characteristics and Mechanisms of HfO2 Thin Films in CF4/O2/Ar and CHF3/O2/Ar Plasma for Nano-Devices
Journal of Nanoscience and Nanotechnology Vol. 14, 9670-9679, 2014
Nomin Lim, Alexander Efremov, Geun Young Yeom and Kwang-Ho Kwon
[2014]
Graphene Treatment Using a Very Low Energy Ar+ Ion Beam for Residue Removal
Journal of Nanoscience and Nanotechnology Vol. 14, 9108?9113, 2014
Kyoung Seok Min, Ki Seok Kim, Kyoung Nam Kim, Anurag Mishra and Geun Young Yeom
[2014]
Etching characteristics and mechanisms of Mo thin films in Cl2/Ar and CF4/Ar inductively coupled plasmas
Japanese Journal of Applied Physics 53, 116201 (2014)
Nomin Lim, Alexander Efremov, Geun Young Yeom, Bok-Gil Choi and Kwang-Ho Kwo
[2014]
Effect of source frequency and pulsing on the SiO2 etching characteristics of dual-frequency capacitive coupled plasma
Japanese Journal of Applied Physics 54, 01AE07 (2015)
Hoe Jun Kim, Min Hwan Jeon, Anurag Kumar Mishra, In Jun Kim, Tae Ho Sin and Geun Young Yeom
[2014]
Characteristics of Pulsed Internal Inductively Coupled Plasma for Next Generation Display Processing
Journal of Nanoscience and Nanotechnology Vol. 14, 9614-9618, 2014
Tae Hyung Kim, Seung Min Lee, Chul Hee Lee, Jeong Oun Bae, Geun Young Yeom and Kyong Nam Kim
[2014]
Characteristics of pulsed dual frequency inductively coupled plasma
Japanese Journal of Applied Physics 54, 01AA10 (2015)
Jin Seok Seo, Kyoung Nam Kim, Ki Seok Kim, Tae Hyung Kim and Geun Young Yeo
[2014]
Effect of RF Pulsing Biasing on the Etching of Magnetic Tunnel Junction Materials Using CH3OH
Journal of Nanoscience and Nanotechnology Vol. 14, 9680–9685, 2014
Min Hwan Jeon, Deok Hyun Yun, Kyung Chae Yang, Ji Youm Youn and Geun Young Yeom
[2014]
Etch Characteristics of Magnetic Tunnel Junction Materials Using Bias Pulsing in the CH4-N2O Inductively Coupled Plasma
Journal of Nanoscience and Nanotechnology Vol. 14, 9541–9547, 2014
Min Hwan Jeon, Ji Youn Youn, Kyung Chae Yang, Deok Hyun Yun and Geun Young Yeom
[2014]
Cyclic chlorine trap-doping for transparent, conductive, thermally stable and damage-free graphene
Nanoscale 6, 24, 15301-8
Viet Phuong Pham, Kyong Nam Kim, Min Hwan Jeon, Ki Seok Kim and Geun Young Yeom
[2014]
A study on the etching characteristics of magnetic tunneling junction materials using DC pulse-biased inductively coupled plasmas
Japanese Journal of Applied Physics 54, 01AE01 (2015)
Kyung Chae Yang, Min Hwan Jeon, and Geun Young Yeom
[2014]
Graphene Doping Methods and Device Applications
Journal of Nanoscience and Nanotechnology Vol. 14, 1120–1133, 2014
Jong Sik Oh, Kyong Nam Kim and Geun Young Yeom
[2014]
Orientation dependence of the fracture behavior of graphene
CARBON 66 (2014) 619–628
Young I. Jhon, Young Min Jhon, Geun Y. Yeom, Myung S. Jhon
[2014]
On the LPCVD-Formed SiO2 Etching Mechanism in CF4ArO2 Inductively Coupled Plasmas Effects of Gas Mixing Ratios and Gas Pressure
Plasma Chem Plasma Process (2014) 34:239–257
Jinyoung Son, Alexander Efremov, Inwoo Chun, Geun Young Yeom and Kwang-Ho Kwon
[2014]
Atomic layer etching of BeO using BCl3/Ar for the interface passivation layer of III–V MOS devices
Microelectronic Engineering 114 (2014) 121–125
K.S. Min, S.H. Kang, J.K. Kim, J.H. Yumg, Y.I. Jhon, T.W. Hudnall, C.W. Bielawski, G.Y. Yeom
[2013]
Enhanced Light Extraction from GaN-Based Vertical Light-Emitting Diodes with a Nano-Roughened N-GaN Surface Using Dual-Etch
Journal of Nanoscience and Nanotechnology Vol. 13, 8064–8069, 2013
Tae Hyung Kim, Kyong Nam Kim, Jin Seok Seo1, Ki Seok Kim, Jeong Oun Bae, and Geun Young Yeom
[2013]
Effect of Plasma-Nitric Acid Treatment on the Electrical Conductivity of Flexible Transparent Conductive Films
Japanese Journal of Applied Physics 52 (2013) 075102
Viet Phuong Pham, Y W Jo, J S Oh, S M Kim, J W Park, S H Kim, M S Jhon and Geun Young Yeom
[2013]
Aluminum-doped zinc oxide formed by atomic layer deposition for use as anodes in organic light emitting diodes
Journal of Vacuum Science & Technology A 31, 01A101 (2013)
Su Cheol Gong, Yong-June Choi, HC Kim, CS Park, HH Park, JG Jang, HJ Chang, and Geun Young Yeom
[2013]
Atomic layer etching removal of damaged layers in a contact hole for low sheet resistance
Journal of Vacuum Science & Technology A 31, 061302 (2013)
Jong Kyu Kim, Sung Il Cho, Sung Ho Lee, Chan Kyu Kim, Kyung Suk Min, and Geun Young Yeom
[2013]
Characteristics of Ga-doped ZnO films deposited by pulsed DC magnetron sputtering at low temperature
Materials ScienceinSemiconductorProcessing16(2013)1957–1963
Kyung-JunAhn, SanghunLee, Won-JeongKim, GeunYoungYeom, WoongLee
[2013]
Characteristics of SiO2 etching by using pulse-time modulation in 60 MHz/2 MHz dual-frequency capacitive coupled plasma
Current Applied Physics 13 (2013) 1830e1836
M.H. Jeon , A.K. Mishra , S.-K. Kang , K.N. Kim , I.J. Kim , S.B. Lee , T.H. Sin , G.Y. Yeom
[2013]
Damaged silicon contact layer removal using atomic layer etching for deep-nanoscale semiconductor devices
Journal of Vacuum Science & Technology A 31, 061310 (2013)
Jong Kyu Kim, Sung Il Cho, Sung Ho Lee, Chan Kyu Kim, Kyung Suk Min, Seung Hyun Kang, and Geun Young
[2013]
Dual frequency ICP discharges: Effect of pressure and gas ratio on EEPF and discharge parameters
Surface & Coatings Technology 237 (2013) 440–444
Anurag Mishra, Geun Young Yeom
[2013]
Effect of bias frequency variation on the characteristics of SiOX thin films deposited by atmospheric pressure chemical vapor deposition using a double discharge system
Thin Solid Films 539 (2013) 12–17
Jaebeom Park, Ga Young Kim, Geunyoung Yeom
[2013]
Formation of Gallium Vacancies and Their Effects on the Nanostructure of Pd/Ir/Au Ohmic Contact to p-Type GaN
Journal of Nanoscience and Nanotechnology Vol. 13, 8106–8109, 2013
Kyong Nam Kim, Tae Hyung Kim, Jin Seok Seo, Ki Seok Kim, Jeong Woon Bae, and Geun Young Yeom
[2013]
Grain boundaries orientation effects on tensile mechanics of polycrystalline graphene
RSC Advances 3, 9897
Young I. Jhon, Pil Seung Chung, Robert Smith, Kyung S. Min ,a Geun Y. Yeom and Myung S. Jhon
[2013]
High open-circuit voltage of graphene-based photovoltaic cells modulated by layer-by-layer transfer
Published online in Wiley Online Library
Kyuwook Ihm, Kyung-Jae Lee, Jong Tae Lim, Tai-Hee Kang, Sukmin Chung, Byung Hee Hong and Geun Young
[2013]
Investigation of the Properties of Ba-Substituted La0.7Sr0.3-xBaxMnO3 Perovskite Manganite Films for Resistive Switching Applications
Journal of ELECTRONIC MATERIALS, Vol. 42, No. 6, 2013
SUN GYU CHOI, HONG-SUB LEE, GEUN YOUNG YEOM, and HYUNG-HO PARK
[2013]
Orientation dependence of the fracture behavior of graphene
CARBON 66 619–628
Young I. Jhon, Young Min Jhon, Geun Y. Yeom, Myung S. Jhon
[2013]
Plasma Characteristics of Inductively Coupled Plasma Using Dual-Frequency Antennas
Japanese Journal of Applied Physics 52 (2013) 05EA02
Tae Hyung Kim, Kyong Nam Kim, Anurag Kumar Mishra, Jin Seok Seo, Ho Boem Jeong, J O Bae and G Y Yeom
[2013]
Plasma Treatment of Thin Film Coated with GrapheneFlakes for the Reduction of Sheet Resistance
Journal of Nanoscience and Nanotechnology Vol. 13, 8090–8094, 2013
Sung Hee Kim, Jong Sik Oh, Kyong Nam Kim, Jin Seok Seo, Min Hwan Jeon, Kyung Chae Yang, and G Y Yeom
[2013]
Selective Etching of Magnetic Tunnel Junction Materials Using CO/NH3 Gas Mixture in Radio Frequency Pulse-Biased Inductively Coupled Plasmas
Japanese Journal of Applied Physics 52 (2013) 05EB03
Min Hwan Jeon, Hoe Jun Kim, Kyung Che Yang, Se Koo Kang, Kyong Nam Kim, and Geun Young Yeom
[2013]
Study of Hydrogenated Silicon Thin Film Deposited by Using Dual-frequency Inductively-coupled Plasma-enhanced Chemical-vapor Deposition
Journal of the Korean Physical Society, Vol. 63, No. 6, September 2013, pp. 1140∼1145
Ho Beom Jeong and Kyong Nam Kim, Nae Eung Lee and Geun Young Yeom
[2013]
Study of the Electronic Structure of the Interfaces Between 2-TNATA and MoOx
Journal of Nanoscience and Nanotechnology Vol. 13, 8025–8031, 2013
Jong Tae Lim, Jin Woo Park, Myung S. Jhon, and Geun Young Yeom
[2013]
Temporal evolution of plasma potential in a large-area pulsed dual-frequency inductively coupled discharge
J. Phys. D: Appl. Phys. 46 (2013) 235203 (9pp)
Anurag Mishra, Jin Seok Seo, Kyong Nam Kim, Geun Young Yeom
[2013]
Interfacial electronic structure of molybdenum oxide on the fullerene layer, a potential hole-injecting layer in inverted top-emitting organic light-emitting diodes
Current Applied Physics 13 (6) , pp. 1037-1041
Jong Tae Lim, Jin Woo Park, and Geun Young Yeom
[2013]
Degradation and modification of stainless-steel surface using Cl2/Ar inductively coupled plasma
Applied Surface Science 279, 41-45
Jang, H., Efremov, A., Yun, S.J., Yeom, G.Y., Kim, K.B., Kwon, K.H.
[2013]
Improved Performance of Organic Light-Emitting Diodes Fabricated on Al-Doped ZnO Anodes Incorporating a Homogeneous Al-Doped ZnO Buffer Layer Grown by Atomic Layer Deposition
ACS Applied Materials and Interfaces 5 (9) , pp. 3650-3655
Choi, Y.J., Gong, S.C., Park, C.S., Lee, H.S., Jang, J.G., Chang, H.J., Yeom, G.Y., Park, H.H.
[2013]
Atomic layer etching of Al2O3 using BCl3/Ar for the interface passivation layer of III-V MOS devices
Microelectronic Engineering 110, 457-460
Min, K.S., Kang, S.H., Kim, J.K., Jhon, Y.I., Jhon, M.S., Yeom, G.Y.
[2013]
Electron-injecting properties of Rb2CO3-doped Alq3 thin films in organic light-emitting diodes
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 31 (3) , art. no. 031101
Jin Woo Park, Jong Tae Lim, Jong Sik Oh, Sung Hee Kim, Phuong Pham Viet, Myung S. Jhon, and Geun Young Yeom
[2013]
Effect of sputtering power on the properties of ZnO:Ga transparent conductive oxide films deposited by pulsed DC magnetron sputtering with a rotating cylindrical target
Applied Surface Science 271 , pp. 216-222
Ahn, K.-J., Park, J.-H., Shin, B.-K., Lee, W., Yeom, G.Y., Myoung, J.-M.
[2013]
Optoelectronic Characteristics of Organic Light-Emitting Diodes with a Rb2CO3-Mixed C60 Layer as an Electron Ohmic-Contact
Journal of the Electrochemical Society 160 (1) , pp. G1-G5
Jong Tae Lim, Jin Woo Park, Jae Wook Kwon, Geun Young Yeom, Kyuwook Lhm, and kyoung Jae Lee
[2013]
Improvement of metal gate high k dielectric CMOSFETs characteristics by atomic layer etching of high k gate dielectric
Solid-State Electronics 82 , pp. 82-85
Min, K.S., Park, C., Kang, C.Y., Park, C.S., Park, B.J., Kim, Y.W., Lee, B.H., (...), Yeom, G.Y.
[2013]
Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 31 (2) , art. no. 021301
Kim, J.K., Cho, S.I., Kim, N.G., Jhon, M.S., Min, K.S., Kim, C.K., Yeom, G.Y.
[2013]
Nanometer-scale fabrication of hydrogen silsesquioxane (HSQ) films with post exposure baking
Journal of Nanoscience and Nanotechnology 13 (3) , pp. 1918-1922
Kim, D.H., Kang, S.K., Yeom, G.Y., Jang, J.H.
[2013]
Modulation of electron energy distributions and discharge parameters in a dual frequency ICP discharge
Plasma Sources Science and Technology 22 (1) , art. no. 015022
Mishra, A., Kim, T.H., Kim, K.N., Yeom, G.Y.
[2013]
Analysis and modeling of the optical endpoint signal for precision etching
Journal of the Korean Physical Society 62 (1) , pp. 53-58
Kim, Y.J., Kim, K.N., Yeom, G.Y.
[2013]
Characteristics of the electromagnetic interference shielding effectiveness of Al-doped ZnO thin films deposited by atomic layer deposition
Applied Surface Science 269 , pp. 92-97
Choi, Y.J., Gong, S.C., Johnson, D.C., Golledge, S., Yeom, G.Y., Park, H.H.
[2012]
Improvement of metal gate/high-k dielectric CMOSFETs characteristics by neutral beam etching of metal gate
Solid-State Electronics 86, 75-78
K.S. Min, C. Park, C.Y. Kang, C.S. Park, B.J. Park, Y.W. Kim, B.H. Lee, Jack C. Lee, G.Y. Yeom
[2012]
Characteristics of the electromagnetic interference shielding effectiveness of Al-doped ZnO thin films deposited by atomic layer deposition
Applied Surface Science
Yong-June Choi, Su Cheol Gong, David C. Johnson, Stephen Golledge, Geun Young Yeom, Hyung-Ho Park
[2012]
Temperature Profile in the Presence of Hotspots in Heat Assisted Magnetic Recording
IEEE TRANSACTIONS ON MAGNETICS, 48, 11, pp4265-4268
Hyung Min Kim, Sesha Hari Vemuri, P.S Chung, Y.I Jhon, Nae-Eung Lee, Geun-Young Yeom, Myung S. Jhon
[2012]
Perfluoropolyether Lubricant Interactions With Novel Overcoat via Coarse-Grained Molecular Dynamics
IEEE TRANSACTIONS ON MAGNETICS, 48, 11, pp4277-4280
Sesha Hari Vemuri, PS Chung, R.Smith, Geun-Young Yeom, Y.I Jhon, Nae-Eung Lee, L T.Biegler, M.S Jhon
[2012]
Study on the oxidation and reduction of tungsten surface for sub-50nm patterning process
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 30, 6, pp061305-061313
Jong Kyu Kim, Seok Woo Nam, Sung Il Cho, Myung S. Jhon, Kyung Suk Min
[2012]
Mass spectrometric study of discharges produced by a large-area dual-frequency–dual-antenna inductively coupled plasma source
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 45, 47, pp475201-475209
Anurag Mishra, Tae Hyung Kim, Kyong Nam Kim and Geun Young Yeom
[2012]
Thermal stability of AgXCu1−X alloys and Pt capping layers for GaN vertical light emitting diodes
Thin Solid Films, 521 , pp54-59
S.H. Kim, T.H. Kim, J.W. Bae, G.Y. Yeom
[2012]
An investigation of the temporal evolution of plasma potential in a 60 MHz/2MHz pulsed dual-frequency capacitively coupled discharge
PLASMA SOURCES SCIENCE & TECHNOLOGY, 21, 5, pp55006-550014
Anurag Mishra, Min Hwan Jeon, Kyong Nam Kim and Geun Young Yeom
[2012]
Characteristics of SiOX thin films deposited by atmospheric pressure chemical vapor deposition using a double-discharge system
MATERIALS RESEARCH BULLETIN, 47, 10, pp3011-3014
Jaebeom Park, Jongsik Oh, Elly Gil, Geun Young Yeom
[2012]
Study of Atmospheric Pressure Chemical Vapor Deposition by Using a Double Discharge System for SiOx thin film deposition with a HMDS/Ar/He/O2 gas mixture
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 61, 3, pp397-401
Ga Young Kim, Jae Beom Park, Geun Young Yeom
[2012]
Synergetic effects in a discharge produced by a dual frequency–dual antenna large-area ICP source
PLASMA SOURCES SCIENCE & TECHNOLOGY, 21, 3, pp35018-35024
Anurag Mishra, Kyong Nam Kim, Tae Hyung Kim and Geun Young Yeom
[2012]
Polymer surface texturing for direct inkjet patterning by atmospheric pressure plasma treatment
Soft Matter, 8, 18, pp5020-5026
Jae Beom Park, Jae Yong Choi, Suk Han Lee, Yong Seol Song and Geun Young Yeom
[2012]
Atomistic simulation method in head-disk interface of magnetic data storage systems
Journal of Applied Physics, 111, (7), pp07B717-07B719
Robert L. Smith, Pil Seung Chung, Sesha Hari Vemuri, Geun-Young Yeom, Lorenz T. Biegler
[2012]
Atomic layer etching of graphene for full graphene device fabrication
Carbon, 50, (2), pp429-435
Woong Sun Lim, Yi Yeon Kim, HG Kim, SJ Jang, NY Kwon, BJ Park, JH Ahn, LS Chung, BH Hong, G Y Yeom
[2012]
Linear inductive antenna design for large area flat panel display plasma processing
MICROELECTRONIC ENGINEERING, 89, (10), pp133
K.N. Kim , J.H. Lim , H.B. Jeong, S.H. Lee, J.K. Lee, S.H. Lee, J.K. Lee
[2011]
Layer by Layer Etching of the Highly Oriented Pyrolythic Graphite by Using Atomic Layer Etching
Journal of The Electrochemical Society, 158 (12) D710-D714
Y. Y. Kim, W. S. Lim, J. B. Park, and G. Y. Yeom
[2011]
Fluorination of Aluminum Oxide Gate Dielectrics Using Fluorine Neutral/Ion Beams
Journal of Nanoscience and Nanotechnology Vol. 11, 5904–5908
Byoung Jae Park, Woong Sun Lim, J.K Yeon, Y.Y Kim, S.K Kang, J.T Lim and Geun Young
[2011]
Linear inductive antenna design for large area flat panel display plasma processing
Microelectronic Engineering 89 133–137
K.N. Kim, J.H. Lim, H.B. Jeong, G.Y. Yeom, S.H. Lee, J.K. Lee
[2011]
Characteristics of SiO2 Etching with a C4F8/Ar/CHF3/O2 Gas Mixture in 60-MHz/2-MHz Dual-frequency Capacitively Coupled Plasmas
Journal of the Korean Physical Society Vol. 59, No. 5, pp. 30243030
M. H. Jeon, S-K. Kang, J. Y. Park and G. Y. Yeom
[2011]
Electrical characteristics of buried-Pt Schottky contacts on thin InP/InAlAs heterostructures
American Vacuum Society 041209-1
S.H Shin,J.I Song and J.H Jang, Tae-Woo Kim, Sang-Duk Park, Jeong-Woon Bae, and Geun-Young Yeom
[2011]
Etch Damage of Ge2Sb2Te5 for Different Halogen Gases
Japanese Journal of Applied Physics 50 086501
Se-Koo Kang, Min-Hwan Jeon, Jong-Yoon Park, Myung S. Jhon, and Geun-Young Yeom
[2011]
Characteristics of hydrogenated silicon thin film deposited by RF-PECVD using HeeSiH4 mixture
Vacuum 86 82e86
In kyo Kim, Jong Hyeuk Lim, Geun Young Yeom
[2011]
Fabrication of trench nanostructures for extreme ultraviolet lithography masks by atomic force microscope lithography
Microelectronics and Nanometer Structures 29, 011034
Gwangmin Kwon and Kyeongkeun Ko,Haiwon Leea, Woongsun Lim and G.Y. Yeom, Sunwoo Lee and Jinho Ahn
[2011]
Effect of Halogen-Based Neutral Beam on the Etching of Ge2Sb2Te5
Journal of The Electrochemical Society, 158 (8) H768-H771
S.-K. Kang, M. H. Jeon, J. Y. Park, G. Y. Yeom, M. S. Jhon,c B. W. Koo and Y. W. Kim
[2011]
Plasma Characteristics of Internal Inductively Coupled Plasma Source with Ferrite Module
Plasma Chem Plasma Process 31:507–515
Jong Hyeuk Lim, Kyong Nam Kim, Min Hwan Jeon, Jong Tae Lim, Geun Young Yeom
[2011]
Removal of Anodic Aluminum Oxide Barrier Layer on Silicon Substrate by using Cl2/BCl3 Neutral Beam Etching
Journal of The Electrochemical Society, 158 (5) D254-D258
J.K.Yeon, W.S.Lim, J.B.Park, N.Y.Kwon, S.I.Kim, K.S.Min, I.S.Chung, Y.W.Kim, and G.Y.Yeom
[2011]
Chemical and Electronic Properties of BaBis(2-methyl-8-quinolinolato)(4-phenylphenolato)Aluminum(III) Interfaces for Organic Light-Emitting Diodes
Journal of Nanoscience and Nanotechnology Vol. 11, 851–855
Jong Tae Lim, Jae Wook Kwon, Jae Beom Park, and Geun Young Yeom
[2011]
Ion Bombardment during the Deposition of SiOX by AC-Biasing in a Remote-Type Atmospheric Pressure Plasma System
Journal of The Electrochemical Society, 158 3 G58-G62
Elly Gil, Jae Beom Park, Jong Sik Oh, Myung S. Jhon, and Geun Young Yeom
[2010]
Etching of CoFeB Using CO/NH3 in an Inductively Coupled Plasma Etching System
Journal of The Electrochemical Society, H1-H4 2011
Jong-Yoon Park, Se-Koo Kang, Min-Hwan Jeon, Myung S. Jhon and Geun-Young Yeom
[2010]
Enhancement-Mode Metal Organic Chemical Vapor Deposition-Grown ZnO Thin-Film Transistors on Glass Substrates Using N2O Plasma Treatment
Japanese Journal of Applied Physics 49 04DF20
Kariyadan Remashan, Y.S Choi, S.K Kang, J.W Bae, G.Y Yeom, S.J Park, and J.H Jang
[2010]
Polyimide Surface Treatment by Atmospheric Pressure Plasma for Metal Adhesion
Journal of The Electrochemical Society, 157 12 D614-D619
J. B. Park, J. S. Oh, E. L. Gil, S. J. Kyoung, J. T. Lim, and G. Y. Yeom
[2010]
High-speed etching of SiO2 using a remote-type pin-to-plate dielectric barrier discharge at atmospheric pressure
JOURNAL OF PHYSICS D: APPLIED PHYSICS 43 425207 (6pp)
Jong Sik Oh, Jae Beom Park, Elly Gil and Geun Young Yeom
[2010]
Highly Selective and Low Damage Etching of GaAs/AlGaAs Heterostructure using Cl2/O2 Neutral Beam
Plasma Chem Plasma Process 30:633–640
B.J.Park, J.K.Yeon, W.S.Lim, S.K.Kang, J.W.Bae, G.Y.Yeom, M.S.Jhon, S.H.Shin, K.S.Chang, J.I.Song
[2010]
Characteristics of SiOx thin films deposited by atmospheric pressure chemical vapor deposition as a function of HMDSO2 flow rate
Thin Solid Films 518 6403–6407
Elly Gil, J.B. Park, J.S. Oh, G.Y. Yeom
[2010]
Light-emitting characteristics of organic light-emitting diodes with the MoOx-doped NPB and C60/LiF layer
Thin Solid Films 518 6339–6342
Jae Wook Kwon, Jong Tae Lim, Geun Young Yeom
[2010]
Plasma Characteristics of 450mm Diameter Ferrite-Enhanced Inductively Coupled Plasma Source
Japanese Journal of Applied Physics 49 080217
Seung Pyo Hong, Jong Hyeuk Lim, Gwang Ho Gweon, and Geun Young Yeom
[2010]
Number of graphene layers as a modulator of the open-circuit voltage of graphene-based solar cell
APPLIED PHYSICS LETTERS 97, 032113
K.W Ihm, J.T Lim, K.J. Lee, J.W Kwon, T.H Kang, S.M Chung, S.K Bae, J.H Kim, B.H. Hong, G.Y Yeom
[2010]
Effect of Capacitor Installed in Series With a Ferrite-Enhanced Internal Linear-Type Antenna on the Properties of an Inductively Coupled Plasma
IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL.38, NO.6 pp1499
Gwang Ho Gweon, Jong Hyeuk Lim, Seung Pyo Hong, and Geun Young Yeom
[2010]
Fabrication of nano-crystalline silicon thin film at low temperature by using a neutral beam deposition method
Journal ofCrystalGrowth312 2145–2149
SeKoo Kang, MinHwanJeon, JongYoonPark, HyoungCheolLee, ByungJaePark, JeKwan Yeon, GeunYoungYeom
[2010]
Effect of DC Bias Voltage on the Characteristics of Low Temperature Silicon–Nitride Films Deposited by Internal Linear Antenna Inductively Coupled Plasma Source
Japanese Journal of Applied Physics 49 056505
Gwang Ho Gweon, Jong Hyeuk Lim, Seung Pyo Hong, and Geun Young Yeom
[2010]
Ferrite-Enhanced U-Shaped Internal Antenna for Large-Area Inductively Coupled Plasma System
IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 38, NO. 2
Kyong Nam Kim, Jong Hyeuk Lim, Woong Sun Lim, and Geun Young Yeom
[2010]
Plasma Characteristics of a Ni–Zn Ferrite Enhanced Internal-Type Inductively Coupled Plasma Source Operated at 2 and 13.56 MHz
Plasma Chem Plasma Process 30:183–190
Kyong Nam Kim, Jong Hyeuk Lim, Geun Young Yeom
[2010]
Characteristics of Internal Inductively Coupled Plasma Source for Ultralarge-Area Plasma Processing
Japanese Journal of Applied Physics 49 030213
Jong Hyeuk Lim, Gwang Ho Gweon, Seung Pyo Hong, Kyong Nam Kim, Yi Yeon Kim, and Geun Young Yeom
[2010]
Characteristics of internal inductively coupled plasma with a ferrite module
JOURNAL OF PHYSICS D: APPLIED PHYSICS 43 095202 (5pp)
Jong Hyeuk Lim, Kyong Nam Kim, Gwang Ho Gwon, Seng Pyo Hong, Seok Hwan Kim and Geun Young Yeom
[2010]
Investigation of the plasma uniformity in an internal linear antenna-type inductively coupled plasma source by applying dual frequency
Vacuum 84 823–827
Gwang Ho Gweon, Jong Hyeuk Lim, Kyong Nam Kim, Seung Pyo Hong, Tae Hong Min, Geun Young Yeom
[2009]
Plasma Characteristics of Large Area Inductively Coupled Plasma System Using Ferrite-Module-Enhanced U-Type Antenna
Japanese Journal of Applied Physics 48 (11) , art. no. 116006
Kim, K.N., Lim, J.H., Yeom, G.Y.
[2009]
Light-Emitting Characteristics of Organic Light-Emitting Diodes with Ba/Al Cathode and Effect of Ba Thickness by Measuring their Built-in Potential
Japanese Journal of Applied Physics 48 (12) , art. no. 122102
Lim, J.T., Yeom, G.Y.
[2009]
Atomic Layer Etching of III-V Compound Materials Using a Low Angle Forward Reflected Ne Neutral Beam
9th IEEE Conference on Nanotechnology, IEEE NANO 2009 , art. no. 5394649 , pp. 345-347
Lim, W.S., Yeom, G.Y., Park, S.D., Kim, Y.Y., Park, B.J.
[2009]
A Novel Damage-Free High-k Etch Technique Using Neutral Beam-Assisted Atomic Layer Etching (NBALE) for Sub-32nm Technology Node Low Power Metal Gate/High-k Dielectric CMOSFETs
Technical Digest - International Electron Devices Meeting, IEDM , art. no. 5424330 , pp. 17.4.1-17.4
Min, K.S., Kang, C.Y., Park, C., Park, C.S., Park, B.J., Park, J.B., Hussain, M.M., Yeom, G.Y
[2009]
Effect of Multi-Polar Magnetic Field on the Properties of Nanocrystalline Silicon Thin Film Deposited by Internal-Type Inductively Coupled Plasma
Journal of Nanoscience and Nanotechnology 9 (12) , pp. 7440-7445
Kim, H.B., Lee, H.C., Kim, K.N., Kang, S.K., Yeom, G.Y.
[2009]
Device Characteristics of Organic Light-Emitting Diodes Based on Electronic Structure of the Ba-Doped Alq3 Layer
Journal of Nanoscience and Nanotechnology 9 (12) , pp. 7485-7490
Lim, J.T., Kim, K.N., Yeom, G.Y.
[2009]
Low Damage Atomic Layer Etching of ZrO2 by Using BCl3 Gas and Ar Neutral Beam
Journal of Nanoscience and Nanotechnology 9 (12) , pp. 7379-7382
Lim, W.S., Park, J.B., Park, J.Y., Park, B.J., Yeom, G.Y.
[2009]
Effect of antenna diameter on the characteristics of internal-type linear inductively coupled plasma
Japanese Journal of Applied Physics 48 (9 Part 1) , pp. 0960021-0960024
Lim, J.H., Kim, K.N., Gweon, G.H., Hong, S.P., Yeom, G.Y.
[2009]
Characteristics of SiOx Thin Film Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition Using PDMS/O2/He
Journal of the Electrochemical Society 156 (7) , pp. D248-D252
Lee, J.H., Kim, Y.S., Oh, J.S., Kyung, S.J., Lim, J.T., Yeom, G.Y.
[2009]
Etch Characteristics of TiO2 Etched by Using an Atomic Layer Etching technique with BCl3 Gas and an Ar Neutral Beam
Journal of the Korean Physical Society 54 (3) , pp. 976-980
Park, J.B., Lim, W.S., Park, S.D., Park, B.J., Yeom, G.Y.
[2009]
Characteristics of SiOx Thin Films Deposited by Using Direct-Type Pin-to-Plate Dielectric Barrier Discharge with PDMS/He/O2 Gases at Low Temperature
Journal of the Korean Physical Society 54 (3) , pp. 981-985
Lee, J.H., Kim, Y.S., Kyung, S.J., Lim, J.T., Yeom, G.Y.
[2009]
Plasma texturing of multicrystalline silicon for solar cell using remote-type pin-to-plate dielectric barrier discharge
Journal of Physics D: Applied Physics 42 (21) , art. no. 215201
Yeom, G.Y., Park, J.B., Oh, J.S., Gil, E., Kyoung, S.-J., Kim, J.-S.
[2009]
Improvement of surface roughness in silicon-on-insulator wafer fabrication using a neutral beam etching
Journal of Physics D: Applied Physics 42 (15) , art. no. 155204
Min, T.H., Park, B.J., Kang, S.K., Gweon, G.H., Kim, Y.Y., Yeom, G.Y.
[2009]
Study of Internal Linear Inductively Coupled Plasma Source for Ultra Large-Scale Flat Panel Display Processing
Plasma Chemistry and Plasma Processing 29 (4) , pp. 251-259
Lim, J.H., Kim, K.N., Gweon, G.H., Park, J.B., Yeom, G.Y.
[2009]
Bulk and Interface effects on voltage linearity of ZrO2–SiO2 multilayered metal-insulator-metal capacitors for analog mixed-signal applications
Applied Physics Letters 95 (2) , art. no. 022905
Park, C., Park, S.D., Gilmer, D.C., Park, H.K., Kang, C.Y., Lim, K.Y., Burham, C., Yeom, G.Y.
[2009]
Neutralization efficiency estimation in a neutral beam source based on inductively coupled plasma
Journal of Applied Physics 105 (1) , art. no. 013308
Vozniy, O.V., Yeom, G.Y.
[2009]
High-energy negative ion beam obtained from pulsed inductively coupled plasma for charge-free etching process
Applied Physics Letters 94 (23) , art. no. 231502
Vozniy, O.V., Yeom, G.Y.
[2009]
Atmospheric pressure PECVD of SiO2 thin film at a low temperature using HMDS/O2/He/Ar
Thin Solid Films 517 (14) , pp. 4065-4069
Kim, Y.S., Lee, J.H., Lim, J.T., Park, J.B., Yeom, G.Y.
[2009]
Residual stress on nanocrystalline silicon thin films deposited under energetic ion bombardment by using internal ICP-CVD
Thin Solid Films 517 (14) , pp. 4100-4103
Lee, H.C., Hong, S.P., Kang, S.K., Yeom, G.Y.
[2009]
Electronic structures of Ba-on- Alq3 interfaces and device characteristics of organic light-emitting diodes based on these interfaces
Journal of Applied Physics 105 (8) , art. no. 083705
Lim, J.T., Yeom, G.Y., Lhm, K., Kang, T.-H.
[2009]
Atomic layer etching of ultra-thin HfO2 film for gate oxide in MOSFET devices
Journal of Physics D: Applied Physics 42 (5) , art. no. 055202
Park, J.B., Lim, W.S., Park, B.J., Park, I.H., Kim, Y.W., Yeom, G.Y.
[2009]
Line-type inductively coupled plasma source with ferromagnetic module
Journal of Physics D: Applied Physics 42 (1) , art. no. 015204
Lim, J.H., Kim, K.N., Gweon, G.H., Yeom, G.Y.
[2008]
Device Performance of the Top-Emitting Organic Light-Emitting Diodes Using the Ba/Au/Indium Tin Oxide Cathode System with Long Skin Depth
Japanese Journal of Applied Physics Vol. 47, No. 10, 2008, pp. 8039–8042
Jong Tae LIM, Chang Hyun JEONG, and Geun Young YEOM
[2008]
Characteristics of Al2O3 gate dielectrics partially fluorinated by a low energy fluorine beam
APPLIED PHYSICS LETTERS 93, 191506 2008
Sung Woo Kim, Byoung Jae Park, Se Koo Kang, Bo Hyun Kong, Hyung Koun Cho, Geun Young Yeom, Sungho H
[2008]
Plasma etching of SiO2 using remote-type pin-to-plate dielectric barrier discharge
JOURNAL OF APPLIED PHYSICS 104, 083302 2008
Jae Beom Park, Se Jin Kyung, and Geun Young Yeom
[2008]
Selective Etching of HfO2 by Using Inductively-Coupled Ar/C4F8 Plasmas and the Removal of Etch Residue on Si by Using an O2 Plasma Treatment
Journal of the Korean Physical Society, Vol. 53, No. 3, September 2008, pp. 16751679
K. S. Min, B. J. Park, S. W. Kim and S. K. Kang, G. Y. Yeom, S. H. Heo and H. S. Hwang, C. Y. Kang
[2008]
Effect of initial crystallized silicon layer on the properties of microcrystalline silicon grown by internal inductively coupled plasma-type plasma enhanced chemical vapor deposition
Surface &Coatings Technology 203 (2008) 799–803
H.C. Lee , H.B. Kim , G.Y. Yeom , I.H. Park , Y.W. Kim
[2008]
Effect of antenna capacitance on the plasma characteristics of an internal linear inductively coupled plasma system
PHYSICS OF PLASMAS 15, 083501 (2008)
Jong Hyeuk Lim, Kyong Nam Kim, Jung Kyun Park, and Geun Young Yeom
[2008]
Characteristics of Plasma Using a Ferromagnetic Enhanced Inductively Coupled Plasma Source
Japanese Journal of Applied Physics Vol. 47, No. 9, 2008, pp. 7339–7342
Kyong Nam KIM, Jong Hyeuk LIM, Jung Kyun PARK, Jong Tae LIM, and Geun Young YEOM
[2008]
Top-emitting organic light-emitting diodes based on semitransparent conducting cathode of Ba/Al/ITO
Surface &Coatings Technology 202 (2008) 5646–5649
J.T. Lim, J.H. Lee, J.K. Park, B.J. Park, G.Y. Yeom
[2008]
Atomic layer etching of (100)/(111) GaAs with chlorine and low angle forward reflected Ne neutral beam
Surface &Coatings Technology 202 (2008) 5701–5704
Woong Sun Lim , Sang Duk Park , Byoung Jae Park , Geun Young Yeom
[2008]
Properties of SixNy thin film deposited by plasma enhanced chemical vapor deposition at low temperature using SiH4/NH3/Ar as diffusion barrier film
Surface &Coatings Technology 202 (2008) 5617–5620
Thuy T.T. Pham, J.H. Lee, Y.S. Kim, G.Y. Yeom
[2008]
Scalable internal linear double comb-type inductively coupled plasma source for large area flat panel display processing
Surface &Coatings Technology 202 (2008) 5242–5245
Kyong Nam Kim, Jong Hyeuk Lim, Jung Kyun Park, Geun Young Yeom
[2008]
X-ray photoelectron spectroscopic study of Ge2Sb2Te5 etched by fluorocarbon inductively coupled plasmas
APPLIED PHYSICS LETTERS 93, 043126 2008
S.-K. Kang, J. S. Oh, B. J. Park, S. W. Kim, J. T. Lim, G. Y. Yeom, C. J. Kang, and G. J. Min
[2008]
A Two-Step-Recess Process Based on Atomic-Layer Etching for High-Performance In0.52Al0.48As/In0.53Ga0.47As p-HEMTs
IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 55, NO. 7, JULY 2008
T.W Kim, D.H Kim, S.D Park, S.H Shin, S.J Jo, H.J Song, Young Min Park, J.O Bae, Y.W Kim, G.Y Yeom
[2008]
Effect of the surface texturing shapes fabricated using dry etching on the extraction efficiency of vertical light-emitting diodes
Solid-State Electronics 52 (2008) 1193–1196
H.C. Lee , J.B. Park , J.W. Bae , Pham Thi Thu Thuy , M.C. Yoo , G.Y. Yeom
[2008]
Laser Annealing on Ti Electrode: Impact on Ti/HfO2/SiO2 n-Type MOSFET
Electrochemical and Solid-State Letters, 11 (10) H276-H279 (2008)
Sungho Heo, R. Dong, Musarrat Hasan, Hyunsang Hwang, S. D. Park,and G. Y. Yeom
[2008]
Plasma-Enhanced Chemical Vapor Deposition of SiO2 Thin Films at Atmospheric Pressure by Using HMDS/Ar/O2
Journal of the Korean Physical Society, Vol. 53, No. 2, August 2008, pp.892~896
Y. S. Kim, J. H. Lee, Thuy. T. T. Pham and J. T. Lim ,G. Y. Yeom
[2008]
Improvement of electron field emission from carbon nanotubes by Ar neutral beam treatment
CARBON 46 (2008) 1316–1321
Se-Jin Kyunga, Jae-Beom Park, Byung-Jae Park, June-Hee Lee, Geun-Young Yeom
[2008]
Top-emitting organic light-emitting diodes with Ba/Ag/indium tin oxide cathode and built-in potential analyses in these devices
American Vacuum Society J. Vac. Sci. Technol. A 26(4) Jul/Aug 2008
J. T. Lim, J. H. Lee, and G. Y. Yeom, E. H. Lee and T. W. Kim
[2008]
Effect of capacitive to inductive coupling transition in multiple linear U-type antenna on silicon thin film deposition from pure SiH4 discharges
American Vacuum Society J. Vac. Sci. Technol. A 26(4)
Hong Bum Kim, Hyoung Cheol Lee, Kyong Nam Kim, and Geun Young Yeom
[2008]
Neutralized fluorine radical detection using single-walled carbon nanotube network
CARBON 46 (2008) 24 –29
Sehun Jung, Seunghyun Hong, Byoungjae Park, Jaeboong Choi, Youngjin Kim, Geunyoung Yeom, Seunghyu
[2008]
Precise Depth Control and Low-Damage Atomic-Layer Etching of HfO2 using BCl3 and Ar Neutral Beam
Electrochemical and Solid-State Letters, 11 (4) H71-H73
S. D. Park, W. S. Lim, B. J. Park, H. C. Lee, J. W. Bae, and G. Y. Yeom
[2008]
Characteristics of SiO2-Like Thin Film Deposited by Atmospheric-Pressure PECVD Using HMDS/O2/Ar
Journal of The Electrochemical Society, 155 (3) D163-D166
J. H. Lee, Thuy. T. T. Pham, Y. S. Kim, J. T. Lim, S. J. Kyung, and G. Y. Yeom
[2008]
Effect of N2O Plasma Treatment on the Performance of ZnO TFTs
Electrochemical and Solid-State Letters, 11 (3) H55-H59
K. Remashan, D. K. Hwang, S. D. Park, J. W. Bae, G. Y. Yeom, S. J. Park and J. H. Jang
[2008]
Uniformity of internal linear-type inductively coupled plasma source for flat panel display processing
APPLIED PHYSICS LETTERS 92, 051504 2008
Jong Hyeuk Lim, Kyong Nam Kim, Jung Kyun Park,Jong Tae Lim, and Geun Young Yeom
[2008]
White top-emitting organic light-emitting diodes using one-emissive layer of the DCJTB doped DPVBi layer
Thin Solid Films 516 (2008) 3590–3594
M.S. Kim , C.H. Jeong , J.T. Lim , G.Y. Yeom
[2008]
Plasma Characteristics and Antenna Electrical Characteristics of an Internal Linear Inductively Coupled Plasma Source with a Multi-Polar Magnetic Field
Plasma Chem Plasma Process (2008) 28:147–158
Kyong Nam Kim, Jong Hyeuk Lim, Jung Kyun Park, Geun Young Yeom, Sung Hee Lee, Jae Koo Lee
[2008]
Comparison of the Electrical Characteristics of Serpentine-Type and Double-Comb-Type Antennas for Large-Area Plasma Generation
Journal of the Korean Physical Society, Vol. 52, No. 2, February 2008, pp. 308312
Jung Kyun Park, Kyong Nam Kim, Jong Hyeuk Lim and Geun Young Yeom
[2008]
Characteristics of a Ferromagnetic-Enhanced Inductively-Coupled Plasma by an Internal Linear Antenna
Journal of the Korean Physical Society, Vol. 52, No. 2, February 2008, pp. 313317
Jong Hyeuk Lim, Kyong Nam Kim, Jung Kyun Park and Geun Young Yeom
[2008]
Light-Emitting Characteristics of Top-Emitting Organic Light-Emitting Diodes Based on the Interfacial Electronic Feature of Cs-on-Alq3
Journal of the Korean Physical Society, Vol. 52, No. 2, February 2008, pp. 476480
Jong Tae Lim, June Hee Lee, Yang Su Kim and G. Y. Yeom
[2008]
Low angle forward reflected neutral beam source and its applications
JOURNAL OF PHYSICS D: APPLIED PHYSICS 41 (2008) 024005 (13pp)
BJ Park, SW Kim, SK Kang, KS Min, SD Park, SJ Kyung, HC Lee, JW Bae, JT Lim, DH Lee and GY Yeom
[2007]
Loss current minimization during ion extraction from an inductively coupled plasma
JOURNAL OF APPLIED PHYSICS 102, 083306 (2007)
Oleksiy Vozniy, Kostyantyn Polozhiy, and Geun Young Yeom
[2007]
High-speed etching of amorphous silicon using pin-to-plate dielectric barrier discharge
Surface and Coatings Technology 202 (4-7) , pp. 1204-1207
Kyung, S.-J., Park, J.-B., Lee, Y.-H., Lee, J.-H., Yeom, G.-Y.
[2007]
Characteristics of Inductively Coupled Plasma using Internal Double Comb-type Antenna for Flat Panel Display Processing
Japanese Journal of Applied Physics, Part 2: Letters 46 (45-49) , pp. L1216-L1218
Lim, J.H., Kim, K.N., Park, J.K., Park, J.H., Yeom, G.Y.
[2007]
Characteristics of Inductive Coupled Plasma with Internal Linear Antenna Using Multi-Polar Magnetic Field for FPD Processing
Diffusion and Defect Data Pt.B: Solid State Phenomena 124-126 (PART 1) , pp. 271-274
Lim, J.H., Kim, K.N., Yeom, G.Y.
[2007]
Inductively Coupled Plasma Source Using Internal Multiple U-Type Antenna for Ultra Large-Area Plasma Processing
Plasma Processes and Polymers 4 (SUPPL.1) , pp. S999-S1003
Jong Hyeuk Lim, Kyong Nam Kim, Geun Young Yeom
[2007]
Formation of High Flux Parallel Neutral Beam using a Three Grid System of Ion Beam during Low Angle Forward Reflection of Ions
Diffusion and Defect Data Pt.B: Solid State Phenomena 124-126 (PART 1) , pp. 275-278
Park, B.-J., Min, K.-S., Park, S.-D., Bae, J.-W., Vozniy, O., Yeom, G.-Y.
[2007]
Four-wavelength white organic light-emitting diodes using 4,40-bis-[carbazoyl-(9)]-stilbene as a deep blue emissive layer
Organic Electronics: physics, materials, applications 8 (6) , pp. 683-689
Jeong, C.H., Lim, J.T., Kim, M.S., Lee, J.H., Bae, J.W., Yeom, G.Y.
[2007]
Effect of Ion Bombardment on the Chemical and the Mechanical Properties of Silicon-Nitride Thin Films Deposited by Using PECVD with SiH4/NH3/Ar Gases at Low Temperature
Journal of the Korean Physical Society 51 (6) , pp. 1934-1939
Pham, T.T.T., Lee, J.H., Kim, Y.S., Yeom, G.Y.
[2007]
Effect of a Two-Step Recess Process Using Atomic Layer Etching on the Performance of In0.52Al0.48As/In0.53Ga0.47As p-HEMTs
IEEE Electron Device Letters 28 (12) , pp. 1086-1088
Kim, T.-W., Kim, D.-H., Park, S.D., Yeom, G.Y., Lim, B.O., Rhee, J.-K., Jang, J.-H., Song, J.-I.
[2007]
Highly selective and low damage atomic layer etching of InP/InAlAs heterostructures for high electron mobility transistor fabrication
Applied Physics Letters 91 (1) , art. no. 013110
Park, S.D., Oh, C.K., Lim, W.S., Lee, H.C., Bae, J.W., Yeom, G.Y., Kim, T.W., (...), Jang, J.H.
[2007]
Atmospheric Pressure Remote Plasma Ashing of Photoresist Using Pin-To-Plate Dielectric Barrier Discharge
Japanese Journal of Applied Physics, Part 2: Letters 46 (36-40) , pp. L942-L944
Park, J., Kyung, S., Yeom, G.
[2007]
Fabrication of InAs composite channel high electron mobility transistors by utilizing Ne-based atomic layer etching
Applied Physics Letters 91 (10) , art. no. 102110
Kim, T.-W., Song, J.-I., Jang, J.H., Kim, D.-H., Park, S.D., Bae, J.W., Yeom, G.Y.
[2007]
Study of selective amorphous silicon etching to silicon nitride using a pin-to-plate dielectric barrier discharge in atmospheric pressure
Applied Physics Letters 91 (9) , art. no. 091504
Kyung, S.-J., Park, J.-B., Lee, J.-H., Lim, J.-T., Yeom, G.-Y.
[2007]
Study on the low-angle surface scattering of the low-energy ions
Journal of the Korean Physical Society 51 (3) , pp. 967-971
Min, K.S., Park, B.J., Park, J.B., Kang, S.K., Yeom, G.Y., Lee, D.H.
[2007]
Blue Organic Light-Emitting Diodes Fabricated by Using an Enhanced Hole-Blocking Property
Journal of the Korean Physical Society 51 (3) , pp. 1019-1022
Lim, J.T., Jeong, C.H., Lee, J.H., Kim, M.S., Bae, J.W., Yeom, G.Y.
[2007]
Transparent Top-Emitting Organic Light-Emitting Diodes Using a Cs/Al/Ag/ITO Semi-Transparent Cathode
Journal of the Korean Physical Society 51 (3) , pp. 1147-1151
Lim, J.T., Jeong, C.H., Kim, M.S., Lee, J.H., Bae, J.W., Yeom, G.Y.
[2007]
Thermally stable Ti/Al/W/Au multilayer ohmic contacts on n-type GaN
Journal of the Korean Physical Society 51 (3) , pp. 1046-1049
Lee, H.C., Bae, J.W., Yeom, G.Y.
[2007]
High-Luminance Top-Emitting Organic Light-Emitting Diodes Using Cs/Al/Au as the Semitransparent Multimetal Cathode
Journal of the Electrochemical Society 154 (10) , pp. J302-J305
Lim, J.T., Jeong, C.H., Lee, J.H., Yeom, G.Y., Shin, E.-C., Lee, E.H., Kim, T.W.
[2007]
Top-emitting organic light-emitting diodes using Cs/Al/Ag cathodes
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 46 (7)
Lim, J.T., Jeong, C.H., Kim, M.S., Lee, J.H., Bae, J.W., Yeom, G.Y.
[2007]
Two-dimensional fluid simulation of large-area plasma source with parallel resonance antenna
Computer Physics Communications 177 (1-2 SPEC. ISS.) , pp. 126
Choi, S., Lee, S., Lee, J., Kim, K., Yeom, G.
[2007]
Synthesis, Structural Characterization and Photoluminescence Properties of SiOx Nanowires Prepared Using a Palladium Catalyst
Journal of the Korean Physical Society 50 (6) , pp. 1799-1802
Kim, H.W., Shim, S.H., Lee, J.W., Lee, C., Hwang, H.J., Chung, S.-Y., Kim, H.-S., (...), Yoon, E.
[2007]
The effect of Ar neutral beam treatment of screen-printed carbon nanotubes for enhanced field emission
Journal of Applied Physics 101 (8) , art. no. 083305
Kyung, S.J., Park, J.B., Park, B.J., Min, K.S., Lee, J.H., Yeom, G.Y., Shin, Y.S., Park, C.Y.
[2007]
Energy shift during ion extraction from an ICP source
Journal of the Korean Physical Society 50 (5) , pp. 1271-1275
Vozniy, O.V., Park, B.J., Min, K.S., Yeom, G.Y.
[2007]
Plasma and antenna characteristics of a linearly extended inductively coupled plasma system using multi-polar magnetic field
Thin Solid Films 515 (12) , pp. 5193-5196
Kim, K.N., Lim, J.H., Yeom, G.Y.
[2007]
Effect of additive gases on the selective etching of ZrOx film using inductively coupled BCl3-based plasmas
Thin Solid Films 515 (12) , pp. 5045-5048
Park, S.D., Lim, J.H., Yeom, G.Y.
[2007]
Effect of Fluorine Ion/Neutral-Beam Irradiation on Ohmic Contact Formation to n-Type GaN
Electrochemical and Solid-State Letters 10 (6) , pp. 161-164
Lee, H.C., Bae, J.W., Park, B.J., Jang, J.H., Yeom, G.Y.
[2007]
Effect of neutral beam etching of p-GaN on the GaN device characteristics
American Vacuum Society J. Vac. Sci. Technol. B 25(2)
Park, B.J., Min, K.S., Lee, H.C., Bae, J.W., Kim, D.W., Yeom, G.Y.
[2007]
Anisotropic Etching of InP and InGaAs by Using an Inductively Coupled Plasma in Cl2/N2 and Cl2/Ar Mixtures at Low Bias Power
Journal of the Korean Physical Society 50 (4) , pp. 1130-1135
Bae, J.W., Jeong, C.H., Lim, J.T., Lee, H.C., Yeom, G.Y., Adesida, I.
[2007]
The effect of atmospheric pressure plasma treatment on the field emission characteristics of screen printed carbon nanotubes
Carbon 45 (3) , pp. 649-654
Kyung, S.-J., Park, J.-B., Voronko, M., Lee, J.-H., Yeom, G.-Y.
[2007]
SiOxNy thin film deposited by plasma enhanced chemical vapor deposition at low temperature using HMDS–O2–NH3–Ar gas mixtures
Surface and Coatings Technology 201 (9-11 SPEC. ISS.) , pp. 4957-4960
Lee, J.H., Jeong, C.H., Lim, J.T., Zavaleyev, V.A., Kyung, S.J., Yeom, G.Y.
[2007]
Effects of inductively coupled plasma treatment using O2, CF4, and CH4 on the characteristics of organic light emitting diodes
Surface and Coatings Technology 201 (9-11 SPEC. ISS.) , pp. 5012-5016
Jeong, C.H., Lee, J.H., Lim, J.T., Kim, M.S., Yeom, G.Y.
[2007]
Top-emitting organic light-emitting diode using transparent conducting indium oxide layer fabricated by a two-step ion beam-assisted deposition
Surface and Coatings Technology 201 (9-11 SPEC. ISS.) , pp. 5358-5362
Lim, J.T., Jeong, C.H., Vozny, A., Lee, J.H., Kim, M.S., Yeom, G.Y.
[2007]
Growth of carbon nanotubes by atmospheric pressure plasma enhanced chemical vapor deposition using NiCr catalyst
Surface and Coatings Technology 201 (9-11 SPEC. ISS.) , pp. 5378-5382
Kyung, S.-J., Voronko, M., Lee, Y.-H., Kim, C.-W., Lee, J.-H., Yeom, G.-Y.
[2007]
High efficiency white organic light-emitting diodes from one emissive layer
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 46 (2)
Jeong, C.H., Lim, J.T., Kim, M.S., Lee, J.H., Bae, J.W., Yeom, G.Y.
[2007]
Surface analysis of atomic-layer-etched silicon by chlorine
Electrochemical and Solid-State Letters 10 (3) , pp. H94-H97
C. K. Oh, S. D. Park, H. C. Lee, J. W. Bae, and G. Y. Yeom
[2007]
Doped-Fluorine on Electrical and Optical Properties of Tin Oxide Films Grown by Ozone-Assisted Thermal CVD
Journal of the Electrochemical Society 154 (1) , pp. D34-D37
Bae, J.W., Lee, S.W., Yeom, G.Y.
[2006]
Effect of dual frequency on the plasma characteristics in an internal linear inductively coupled plasma source
Applied Physics Letters 89 (25) , art. no. 251501
Kim, K.N., Lim, J.H., Yeom, G.Y., Lee, S.H., Lee, J.K.
[2006]
Improvement of field emission from screen-printed carbon nanotubes by He/(N2,Ar) atmospheric pressure plasma treatment
Journal of Applied Physics 100 (12) , art. no. 124303
Kyung, S.J., Park, J.B., Lee, J.H., Yeom, G.Y.
[2006]
OLED deposition characteristics for 4th generation mass-production
Digest of Technical Papers - SID International Symposium 37 (1) , pp. 432-435
Kim, C.W., Kwon, H.G., Rho, J.S., Yoon, J.S., Bae, K.B., Jeong, C.H., Yeom, G.Y.
[2006]
CF4-based neutral-beam etch characteristics of Si and SiO 2 using a low-angle forward-reflected neutral-beam etching system
Journal of the Korean Physical Society 49 (6) , pp. 2307-2310
Lee, D.H., Park, B.J., Min, K.S., Yeom, G.Y.
[2006]
Characteristics of SiOxNy films deposited by inductively coupled plasma enhanced chemical vapor deposition using HMDS/NH3/O2/Ar for water vapor diffusion barrier
Thin Solid Films 515 (3) , pp. 917-921
Lee, J.H., Jeong, C.H., Kim, H.B., Lim, J.T., Kyung, S.J., Yeom, G.Y.
[2006]
White organic light-emitting diodes from three emitter layers
Thin Solid Films 515 (3) , pp. 891-895
Kim, M.S., Lim, J.T., Jeong, C.H., Lee, J.H., Yeom, G.Y.
[2006]
Characteristics of Large Area Inductively Coupled Plasma Using a Multiple Linear Antennas with U-Type Parallel Connection for Flat Panel Display Processing
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 45
Kyong Nam KIM, Kyung Seok MIN and Geun Young YEOM
[2006]
Effect of Indium-Oxide Deposited Using an Oxygen Ion-Beam-Assisted-Deposition to Top-Emitting Organic Light-Emitting Diodes
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 45
Jeong, C.H., Lim, J.T., Lee, J.H., Kim, M.S., Bae, J.W., Yeom, G.Y.
[2006]
Characteristics of a multilayer SiOx(CH)yN z film deposited by low temperature plasma enhanced chemical vapor deposition using Hexamethyldisilazane/Ar/N2O
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 45
Lee, J.H., Jeong, C.H., Lim, J.T., Zavaleyev, V.A., Kyung, S.J., Yeom, G.Y.
[2006]
Investigation of the Magnetic Properties of an RF-Driven Inductively Coupled Argon Plasma
Journal of the Korean Physical Society 49 (4) , pp. 1460-1464
Vozniy, O., Voronko, M., Park, B.J., Yeom, G.Y.
[2006]
Atomic layer etching of InP using a low angle forward reflected Ne neutral beam
Applied Physics Letters 89 (4) , art. no. 043109
Park, S.D., Oh, C.K., Bae, J.W., Yeom, G.Y., Kim, T.W., Song, J.I., Jang, J.H.
[2006]
Photoresist ashing technology using N2/O2 ferrite-core ICP in the dual damascene process
Journal of Materials Science 41 (15) , pp. 5040-5042
Kim, H.W., Myung, J.H., Lee, J.W., Kim, H.S., Kim, K., Jang, J.Y., Yoon, T.H., (...), Kim, H.-J.
[2006]
Field emission properties of carbon nanotubes synthesized by capillary type atmospheric pressure plasma enhanced chemical vapor deposition at low temperature
Carbon 44 (8) , pp. 1530-1534
Kyung, S.J., Lee, Y.H., Kim, C.W., Lee, J.H., Yeom, G.Y.
[2006]
Nanostructures fabrication on Ta thin film using atomic force microscope lithography
Molecular Crystals and Liquid Crystals 445 , pp. 115/[405]-118/[408]
Lee, S., Lee, H., Lee, D.H., Park, B.J., Yeom, G.Y.
[2006]
Synthesis and characteristics of bis(2,4-dimethyl-8-quinolinolato) (triphenylsilanolato)aluminum
Journal of Organometallic Chemistry 691(12) , pp. 2701-2707
Lim, J.T., Jeong, C.H., Lee, J.H., Yeom, G.Y., Jeong, H.K., Chai, S.Y., Lee, I.M., Lee, W.I.
[2006]
Deposition of carbon nanotubes by capillary-type atmospheric pressure PECVD
Thin Solid Films 506-507 , pp. 268-273
Kyung, S., Lee, Y., Kim, C., Lee, J., Yeom, G.
[2006]
Low impedance antenna arrangement of internal linear ICP source for large area FPD processing
Thin Solid Films 506-507 , pp. 460-463
Jung, S.J., Kim, K.N., Yeom, G.Y.
[2006]
Effective plasma confinement by applying multipolar magnetic fields in an internal linear inductively coupled plasma system
Applied Physics Letters 88 (16) , art. no. 161503
Kim, K.N., Kim, M.S., Yeom, G.Y.
[2006]
Study on the O2 plasma treatment of indium tin oxide for organic light emitting diodes using inductively coupled plasma
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 45 (4)
Jeong, C.H., Lee, J.H., Lim, J.H., Lim, J.T., Yeom, G.Y.
[2006]
Characteristic of carbon nanotubes synthesized by pin-to-plate type atmospheric pressure plasma enhanced chemical vapor deposition at low temperature
Carbon, 44 799–823
Yong-Hyuk Lee, Se-Jin Kyung, Chan-Woo Kim, Geun-Young Yeom
[2006]
White Organic Light-Emitting Diodes Using Bis(2,4-dimethyl-8-quinolinolato)(triphenylsilanolato) Aluminum(III) as a New Hole-Blocking Layer
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 45.
Lim, J.T., Jeong, C.H., Lee, J.H., Lim, J.H., Yeom, G.Y.
[2006]
Plasma and Electrical Characteristics of a Novel Internal Linear Inductively Coupled Plasma Source for Flat Panel Display Applications
Journal of the Korean Physical Society 48 (3) , pp. 422-426
Kim, K.N., Yeom, G.Y.
[2006]
Selective plasma etching of ZrOx to Si using inductively coupled BCl3/C4F8 plasmas
Applied Physics Letters 88 (9) , art. no. 094107
S. D. Park, J. H. Lim, C. K. Oh, H. C. Lee, and G. Y. Yeom
[2006]
Characteristics of a large-area plasma source using internal multiple U-type antenna
Journal of the Korean Physical Society 48 (2) , pp. 256-259
Kyong Nam Kim and Geun Young Yeom
[2006]
Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperature Using BTBAS-NH3-O2
Journal of the Korean Physical Society 48 (1) , pp. 89-92
June Hee Lee, Chang Hyun Jeong, Jong Tae Lim, V.A.Zavaleyev, Kyung Suk Min, Geun Young Yeom
[2005]
Selective growth of nanometre scale structures with high resolution using thermal energy in AFM lithography
Nanotechnology 16 (12) , pp. 3137-3141
Lee, S., Lee, H., Park, B.J., Yeom, G.Y.
[2005]
A Study of Electrical Damage to a-SiH Thin Film Transistor during Plasma Ashing by a Pin-to-Plate Type Atmospheric Pressure Plasma
Japanese Journal of Applied Physics, Part 2: Letters 44 (46-49) , pp. L1456-L1459
Lee, Y.H., Kyung, S.J., Lim, J.H., Yeom, G.Y.
[2005]
Plasma and impedance characteristics of internal linear antennas for flat panel display applications
Thin Solid Films 491 (1-2) , pp. 82-85
Kim, K.N., Jung, S.J., Yeom, G.Y.
[2005]
Surface Roughness Variation during Si Atomic Layer Etching by Chlorine Adsorption Followed by an Ar Neutral Beam Irradiation
Electrochemical and Solid-State Letters 8 (11) , pp. C177-C179
Park, S.D., Oh, C.K., Lee, D.H., Yeom, G.Y.
[2005]
Novel Internal Linear Inductively Coupled Plasma Source for Flat Panel Display Applications
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 44 (11)
Kim, K.N., Jung, S.J., Yeom, G.Y.
[2005]
Effects of Tin Concentration and Post-Annealing on the Electrical and the Optical Properties of In2−xSnxO3 (x = 0 ~ 0.25) Deposited at Room Temperature
Journal of the Korean Physical Society 47 (5) , pp. 889-894
Bae, J.W., Lee, H.C., Yeom, G.Y.
[2005]
Growth and Field-Emission Properties of Multiwalled Carbon Nanotubes Synthesized by a Pin-to-Plate-Type Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition
Journal of the Korean Physical Society 47 (5) , pp. 818-821
Kyung, S.J., Voronko, M., Lee, J.H., Yeom, G.Y.
[2005]
Properties of SiOxNy thin film deposited by low temperature plasma enhanced chemical vapor deposition using TEOS–NH3–O2–N2 gas mixtures
Surface and Coatings Technology 200 (1-4 SPEC. ISS.) , pp. 680-685
Lee, J.H., Jeong, C.H., Lim, J.T., Jo, N.G., Kyung, S.J., Yeom, G.Y.
[2005]
Etching characteristics of multiple U-type internal linear inductively coupled plasma for flat panel display
Surface and Coatings Technology 200 (1-4 SPEC. ISS.) , pp. 780-783
Jung, S.J., Kim, K.N., Yeom, G.Y.
[2005]
Characteristics of inductively coupled plasma with multiple U-type internal antenna for flat panel display applications
Surface and Coatings Technology 200 (1-4 SPEC. ISS.) , pp. 784-787
Kim, K.N., Jung, S.J., Yeom, G.Y.
[2005]
Atomic layer etching of Si(100) and Si(111) using Cl2 and Ar neutral beam
Electrochemical and Solid-State Letters 8 (8) , pp. C106-C109
Park, S.D., Lee, D.H., Yeom, G.Y.
[2005]
A study of transparent contact to vertical GaN-based light-emitting diodes
Journal of Applied Physics 98 (5) , art. no. 053102
Kim, D.W., Lee, H.Y., Yeom, G.Y., Sung, Y.J.
[2005]
Effect of Pretreatment on the Deposition of Carbon Nanotubes by Using Atmospheric-Pressure Plasma-Enhanced Chemical-Vapor Deposition
Journal of the Korean Physical Society 47 (3) , pp. 463-468
Kyung, S.J., Lee, Y.H., Kim, C.W., Lee, J.H., Yeom, G.Y.
[2005]
Atomic Layer Etching of Cl-Adsorbed Silicon by Using a Low-Angle Forward Reflected Ar Neutral Beam
Journal of the Korean Physical Society 47 (3) , pp. 469-473
Park, S.D., Lee, D.H., Yeom, G.Y.
[2005]
Structural and Electrical Analysis of Silicon Thin Films Deposited by Transformer-Coupled-Plasma Chemical-Vapor Deposition
Journal of the Korean Physical Society 47 (2) , pp. 277-282
Lee, H.C., Yeom, G.Y., Lee, Y.J., Shin, J.K., Baik, S.I., Kim, Y.W.
[2005]
Indium-Oxide Thin Films Deposited by Using an Oxygen-Ion-Beam-Assisted Deposition Technique for Top-Emitting Organic Light-Emitting Diodes
Journal of the Korean Physical Society 47 (1) , pp. 142-147
Lim, J.T., Cho, N.G., Jeong, C.H., Lee, J.H., Lim, J.H., Yeom, G.Y.
[2005]
Characteristics of a pin-to-plate dielectric barrier discharge in helium
Journal of the Korean Physical Society 47 (1) , pp. 74-78
Lee, Y.H., Yeom, G.Y.
[2005]
Low-impedance internal linear inductive antenna for large-area flat panel display plasma processing
Journal of Applied Physics 97 (6) , art. no. 063302
Kim, K.N., Jung, S.J., Lee, Y.J., Yeom, G.Y., Lee, S.H., Lee, J.K.
[2005]
Effect of GaN microlens array on efficiency of GaN-based blue-light-emitting diodes
Japanese Journal of Applied Physics, Part 2: Letters 44 (1-7) , pp. L18-L20
Kim, D., Lee, H., Cho, N., Sung, Y., Yeom, G.
[2005]
Characteristics of Organic Light-Emitting Devices by the Surface Treatment of Indium Tin Oxide Surfaces Using Atmospheric Pressure Plasmas
Japanese Journal of Applied Physics, Part 2: Letters 44 (1-7) , pp. L41-L44
Jeong, C.H., Lee, J.H., Lee, Y.H., Cho, N.G., Lim, J.T., Moon, C.H., Yeom, G.Y.
[2005]
Effects of Axial Magnetic Field on Neutral Beam Etching by Low-Angle Forward-Reflected Neutral Beam Method
Japanese Journal of Applied Physics, Part 2: Letters 44 (1-7) , pp. L63-L66
Lee, D., Park, B., Yeom, G.
[2005]
The Effect of N2 Flow Rate in HeO2N2 on the Characteristics of Large Area Pin-to-Plate Dielectric Barrier Discharge
Japanese Journal of Applied Physics, Part 2: Letters 44 (1-7) , pp. L78-L81
Lee, Y.H., Kyung, S.J., Jeong, C.H., Yeom, G.Y.
[2005]
Fabrication of SiC micro-lens by plasma etching
Thin Solid Films 475 (1-2 SPEC. ISS.) , pp. 318-322
Lee, H.Y., Kim, D.W., Sung, Y.J., Yeom, G.Y.
[2005]
Fabrication of Si nano-pillar array through Ni nano-dot mask using inductively coupled plasma
Thin Solid Films 475 (1-2 SPEC. ISS.) , pp. 41-44
Kim, M.J., Lee, J.S., Kim, S.K., Yeom, G.Y., Yoo, J.B., Park, C.Y.
[2005]
Characteristics of carbon nanotubes deposited by using low-temperature atmospheric-pressure plasma-e
Journal of the Korean Physical Society 46 (4) , pp. 918-921
Kim, C., Lee, Y., Kyung, S., Yeom, G.
[2005]
Removal of Aspect-Ratio-Dependent Etching by Low-Angle Forward Reflected Neutral-Beam Etching
Journal of the Korean Physical Society 46 (4) , pp. 867-871
Lee, D.H., Park, B.J., Yeom, G.Y., Kim, S.J., Lee, J.K., Baek, K.H., Kang, C.J.
[2005]
Characteristic of SiO2 Films Deposited by Using Low-Temperature PECVD with TEOS/N2/O2
Journal of the Korean Physical Society 46 (4) , pp. 890-894
Lee, J.H., Jeong, C.H., Lim, J.T., Jo, N.G., Kyung, S.J., Yeom, G.Y.
[2005]
Simulation of ion beam transport in an ion gun for materials processing
IEEE Transactions on Plasma Science 33 (2 I) , pp. 538-539
Kim, S.J., Wang, S.J., Lee, J.K., Yeom, G.Y.
[2005]
Characteristics of silicon carbide etching using magnetized inductively coupled plasma
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 44 (3)
Lee, H.Y., Kim, D.W., Sung, Y.J., Yeom, G.Y.
[2005]
Properties and Applications of a Modified Dielectric Barrier Discharge Generated at Atmospheric Pressure
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 44 (2)
Yong-Hyuk LEE and Geun-Young YEOM
[2005]
Deposition of SiO2 by Plasma Enhanced Chemical Vapor Deposition as the Diffusion Barrier to Polymer Substrates
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 44 (2)
Jeong, C.H., Lee, J.H., Lim, J.T., Cho, N.G., Moon, C.H., Yeom, G.Y.
[2005]
Highly efficient vertical laser-liftoff GaN-based light-emitting diodes formed by optimization of the cathode structure
Applied Physics Letters 86 (5) , art. no. 052108 , pp. 1-3
Kim, D.W., Lee, H.Y., Yoo, M.C., Yeom, G.Y.
[2005]
Precise depth control of silicon etching using chlorine atomic layer etching
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 44 (1)
Sang-Duk PARK, Kyung-Suk MIN, Byoung-Young YOON, Do-Haing LEE and Geun-Young YEOM
[2004]
Etching of Copper Films for Thin Film Transistor Liquid Crystal Display using Inductively Coupled Chlorine-Based Plasmas
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 43.
Jang, K.H., Lee, W.J., Kim, H.R., Yeom, G.Y.
[2004]
Requirements of Neutral Beam Source Regarding Gas Pressure and Neutral Angle for Nanoscale Etching
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 43.
Kim, S.J., Lee, H.J., Yeom, G.Y., Koo, J.L.
[2004]
Reduction of the electrostatic coupling in a large-area internal inductively coupled plasma source using a multicusp magnetic field
Applied Physics Letters 85 (10) , pp. 1677-1679
Lee, Y.J., Kim, K.N., Yeom, G.Y., Lieberman, M.A.
[2004]
Generation of low-energy neutral beam for Si etching
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 22 (5) , pp. 1948-1955
Kim, S.J., Wang, S.J., Lee, J.K., Lee, D.H., Yeom, G.Y.
[2004]
Characteristics of Parallel Internal-Type Inductively Coupled Plasmas for Large Area Flat Panel Display Processing
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 43.
Kim, K.N., Lee, Y.J., Jung, S.J., Yeom, G.Y.
[2004]
Magnetically enhanced inductively coupled plasma etching of 6H-SiC
IEEE Transactions on Plasma Science 32 (3 II) , pp. 1362-1366
Kim, D.W., Lee, H.Y., Kyoung, S.J., Kim, H.S., Sung, Y.J., Chae, S.H., Yeom, G.Y.
[2004]
Global warming gas emission during plasma cleaning process of silicon nitride using c-C4F8O/O2 chemistry with additive Ar and N2
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 22 (2).
Kim, K.J., Oh, C.H., Lee, N.-E., Kim, J.H., Bee, J.W., Yeom, G.Y., Yoon, S.S.
[2004]
High rate etching of 6H-SiC in SF6-based magnetically-enhanced inductively coupled plasmas
Thin Solid Films 447-448 , pp. 100-104
Kim, D.W., Lee, H.Y., Park, B.J., Kim, H.S., Sung, Y.J., Chae, S.H., Ko, Y.W., Yeom, G.Y.
[2004]
Oxide surface cleaning by an atmospheric pressure plasma
Surface and Coatings Technology 177-178 , pp. 711-715
Yi, C.H., Jeong, C.H., Lee, Y.H., Ko, Y.W., Yeom, G.Y.
[2004]
Effect of additive gases on the selective etching of tungsten films using inductively coupled halogen-based plasmas
Thin Solid Films 447-448 , pp. 586-591
Park, S.D., Lee, Y.J., Cho, N.G., Kim, S.G., Choe, H.H., Hong, M.P., Yeom, G.Y.
[2004]
Effects of multipolar magnetic fields on the characteristics of plasma and photoresist etching in an internal linear inductively coupled plasma system
Surface and Coatings Technology 177-178 , pp. 752-757
Kim, K.N., Lee, Y.J., Kyong, S.J., Yeom, G.Y.
[2004]
Effect of plasma cleanings on the characteristics of MgO layer for plasma display panel
Surface and Coatings Technology 177-178 , pp. 705-710
Hwang, H.K., Jeong, C.H., Lee, Y.J., Ko, Y.W., Yeom, G.Y.
[2004]
Characteristics of neutral beam generated by reflection on a planar-type reflector and its etching properties
Surface and Coatings Technology 177-178 , pp. 420-425
Lee, D.H., Jung, S.J., Park, S.D., Yeom, G.Y.
[2003]
Oxide surface cleaning by an atmospheric pressure plasma
Surface and Coatings Technology xx (2003) xxx–xxx
Chang Heon Yi, Chang Hyun Jeong, Yong Hyuk Lee, Young Wook Ko, Geun Young Yeom
[2003]
Internal linear inductively coupled plasma (ICP) sources for large area FPD etch process applications
Materials Science in Semiconductor Processing 5 (2003) 419–423
Y.J. Lee, K.N. Kim, B.K. Song, G.Y. Yeom
[2003]
High rate etching of 6H–SiC in SF6-based magnetically-enhanced inductively coupled plasmas
Thin Solid Films xx (2003) xxx–xxx
D.W. Kim, H.Y. Lee, B.J. Park, H.S. Kim, Y.J. Sung, S.H. Chae, Y.W. Ko, G.Y. Yeom
[2003]
Effects of multipolar magnetic fields on the characteristics of plasma and photoresist etching in an internal linear inductively coupled plasma system
Surface and Coatings Technology xx (2003) xxx–xxx
K.N. Kim, Y.J. Lee, S.J. Kyong, G.Y. Yeom
[2003]
Effects of Additive Gases on Ag Etching Using Inductively Coupled Cl2-Based Plasmas
Journal of the Korean Physical Society, Vol. 42, February 2003, pp. S804~S808
S. D. Park, Y. J. Lee and G. Y. Yeom, S. G. Kim, H. H. Choe and M. P. Hong
[2003]
Effect of plasma cleanings on the characteristics of MgO layer for plasma display panel
Surface and Coatings Technology xx (2003) xxx–xxx
H.K. Hwang, C.H. Jeong, Y.J. Lee, Y.W. Ko, G.Y. Yeom
[2003]
Characteristics of neutral beam generated by reflection on a planar-type reflector and its etching properties
Surface and Coatings Technology xx (2003) xxx–xxx
D.H. Lee, S.J. Jung, S.D. Park, G.Y. Yeom
[2003]
Etch characteristics of silver by inductively coupled fluorine-based plasmas
Thin Solid Films 445 (1) , pp. 138-143
Park, S.D., Lee, Y.J., Kim, S.G., Choe, H.H., Hong, M.P., Yeom, G.Y.
[2003]
Room-temperature GaN vertical-cavity surface-emitting laser operation in an extended cavity scheme
Applied Physics Letters 83 (11) , pp. 2121-2123
Park, S.H., Kim, J., Jeon, H., Sakong, T., Lee, S.N., Chae, S., Park, Y., (...), Cho, Y.H.
[2003]
The characteristics of large area processing plasmas
IEEE Transactions on Plasma Science 31 (4 II) , pp. 628-637
Park, S.E., Cho, B.U., Lee, J.K., Lee, Y.J., Yeom, G.Y.
[2003]
Sapphire etching with BCl3/HBr/Ar plasma
Surface and Coatings Technology 171 (1-3) , pp. 280-284
Jeong, C.H., Kim, D.W., Lee, H.Y., Kim, H.S., Sung, Y.J., Yeom, G.Y.
[2003]
Influence of substrate temperature on the etching of silver films using inductively coupled Cl2-based plasmas
Surface and Coatings Technology 171 (1-3) , pp. 285-289
Park, S.D., Lee, Y.J., Kim, S.G., Choe, H.H., Hong, M.P., Yeom, G.Y.
[2003]
Diagnostics of neutral species in the low-angle forward-reflected neutral beam etching system
Surface and Coatings Technology 171 (1-3) , pp. 231-236
Chung, M.J., Lee, D.H., Yeom, G.Y.
[2003]
High rate sapphire (Al2O3) etching in inductively coupled plasmas using axial external magnetic field
Thin Solid Films 435 (1-2) , pp. 242-246
Kim, D.W., Jeong, C.H., Kim, K.N., Lee, H.Y., Kim, H.S., Sung, Y.J., Yeom, G.Y.
[2003]
Increase of cleaning rate and reduction in global warming effect during C4F8O/O2 remote plasma cleaning of silicon nitride by adding NO and N2O
Thin Solid Films 435 (1-2) , pp. 264-269
Oh, C.H., Lee, N.E., Kim, J.H., Yeom, G.Y., Yoon, S.S., Kwon, T.K.
[2003]
Effect of N-containing additive gases on global warming gas emission during remote plasma cleaning process of silicon nitride PECVD chamber using C4F8-O2-Ar chemistry
Surface and Coatings Technology 171 (1-3) , pp. 267-272
Oh, C.H., Lee, N.E., Kim, J.H., Yeom, G.Y., Yoon, S.S., Kwon, T.K.
[2003]
Linear internal inductively coupled plasma (ICP) source with magnetic fields for large area processing
Thin Solid Films 435 (1-2) , pp. 275-279
Lee, Y.J., Kim, K.N., Song, B.K., Yeom, G.Y.
[2003]
The study of atmospheric pressure plasma for surface cleaning
Surface and Coatings Technology 171 (1-3) , pp. 237-240
Yi, C.H., Lee, Y.H., Yeom, G.Y.
[2003]
High-rate dry etching of ZnO in BCl3/CH4/H2 plasmas
Japanese Journal of Applied Physics, Part 2: Letters 42 (5 B) , pp. L535-L537
Bae, J.W., Jeong, C.H., Kim, H.K., Kim, K.K., Cho, N.G., Seong, T.Y., Park, S.J., (...), Yeom
[2003]
A study of GaN etching characteristics using HBr-based inductively coupled plasmas
Solid-State Electronics 47 (3) , pp. 549-552
Kim, D.W., Jeong, C.H., Lee, H.Y., Kim, H.S., Sung, Y.J., Yeom, G.Y.
[2003]
Effect of N-based Gases to C3F8/O2 on Global Warming during Silicon Nitride PECVD Chamber Cleaning Using a Remote Plasma Source
Journal of the Korean Physical Society 42 (SUPPL.2) , pp. S800-S803
Kim, J.H., Oh, C.H., Lee, N.-E., Yeom, G.Y.
[2003]
Effect of additive gases on the selective etching of tungsten films using inductively coupled halogen-based plasmas
Journal of the Korean Physical Society 42 (SUPPL.2) , pp. S804-S808
Park, S.D., Lee, Y.J., Yeom, G.Y., Kim, S.G., Choe, H.H., Hong, M.P.
[2003]
High rate sapphire etching using BCl3-based inductively coupled plasma
Journal of the Korean Physical Society 42 (SUPPL.2) , pp. S795-S799
Kim, D.W., Jeong, C.H., Kim, K.N., Lee, H.Y., Kim, H.S., Yeom, G.Y., Sung, Y.J.
[2003]
The etching mechanism of (Zr0.8Sn0.2)TiO4(ZST) film by using Cl2/O2-gas plasma
Journal of the Korean Physical Society 42 (SUPPL.2) , pp. S809-S813
Kwon, K.H., Efremov, A.M., Yeom, G.Y., Kang, Y.I.
[2003]
Characteristic of a dielectric barrier discharges using capillary dielectric and its application to photoresist etching
Surface and Coatings Technology 163-164 , pp. 723-727
Yi, C.H., Lee, Y.H., Kim, D.W., Yeom, G.Y.
[2003]
Etch damage evaluation of low-angle, forward-reflected neutral beam etching
Materials Science and Engineering C 23 (1-2) , pp. 221-224
Lee, D.H., Chung, M.J., Hwang, H.K., Yeom, G.Y.
[2003]
Effect of an Atmospheric Pressure Plasma Cleaning on the Outgassing Characteristics of MgO Layer for Plasma Display Panel
Japanese Journal of Applied Physics, Part 2: Letters 42 (1 A/B) , pp. L74-L76
Song, B.K., Lee, Y.J., Yi, C.H., Hwang, H.K., Yeom, G.Y.
[2003]
Characteristics of Ag etching using inductively coupled Cl2-based plasmas
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 42 (1)
Lee, Y.J., Park, S.D., Song, B.K., Kim, S.G., Choe, H.H., Hong, M.P., Yeom, G.Y.
[2002]
Effect of microstructures on the coercivity of Fe1-xBx
Vacuum 67 (2002) 185–189
Hyoun-Soo Shin, Jong-Wook Hong, Taesuk Jang, Eui-Park Yoon,Insoo Kim, Geun-Young Yeum, Jong-Wan Park
[2002]
Effect of N2O to C4F8/O2 on GlobalWarming during Silicon Nitride Plasma Enhanced Chemical Vapor Deposition (PECVD) Chamber Cleaning Using a Remote Inductively Coupled Plasma Source
Jpn. J. Appl. Phys. Vol. 41 (2002) pp. L 1495–L 1498
Ji Hwang KIM, Chang Hyun OH, Nae Eung LEE and Geun Young YEOM
[2002]
Study on the low-angle forward-reflected neutral beam etching system for SiO2 etching
Thin Solid Films 420-421 , pp. 579-583
Chung, M.J., Lee, D.H., Yeom, G.Y.
[2002]
Damage during SiO2 etching by low-angle forward reflected neutral beam
Japanese Journal of Applied Physics, Part 2: Letters 41 (12 A) , pp. L1412-L1415
Lee, D., Chung, M., Park, S., Yeom, G.
[2002]
C4F8O/O2/N-based Additive Gases for Silicon Nitride Plasma Enhanced Chemical Vapor Deposition Chamber Cleaning with Low Global Warming Potentials
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 41 (11)
Kim, J.H., Bae, J.W., Oh, C.H., Kim, K.J., Lee, N.E., Yeom, G.Y.
[2002]
A study of sapphire etching characteristics using BCl3-based inductively coupled plasmas
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 41 (10)
Jeong, C.H., Kim, D.W., Kim, K.N., Yeom, G.Y.
[2002]
Effects of Tin Concentration on the Electrical Properties of Room-Temperature Ion-Beam-Assisted-Evaporation-Deposited Indium Oxide Thin Films
Japanese Journal of Applied Physics, Part 2: Letters 41 (9 A/B) , pp. L999-L1001
Bae, J.W., Park, S.D., Cho, N.G., Lee, D.H., Yeom, G.Y.
[2002]
Dry etching of sapphire substrate for device separation in chlorine-based inductively coupled plasma
Materials Science and Engineering B: Solid-State Materials for Advanced Technology 93 (1-3) , pp. 60
Jeong, C.H., Kim, D.W., Bae, J.W., Sung, Y.J., Kwak, J.S., Park, Y.J., Yeom, G.Y.
[2002]
Surface Properties of GaN Fabricated by Laser Lift-Off and ICP Etching
Journal of the Korean Physical Society 40 (4) , pp. 567-571
Kim, H.S., Dawson, M.D., Yeom, G.Y.
[2002]
Particle-in-cell simulation of a neutral beam source for materials processing
IEEE Transactions on Plasma Science 30 (1 I) , pp. 110-111
Min Sup Hur, Sung Jin Kim, Ho Seung Lee, Jae Koo Lee, and Geun-Young Yeom
[2001]
Fabrication and properties of microcantilever using piezoelectric PZT thin films
Ferroelectrics 263 (1) , pp. 241-246
Ahn, J., Kim, D., Yeom, G., Yoo, J., Lee, J.
[2001]
Etch characteristics of SrBi2Ta2O9 (SBT) thin films using magnetized inductively coupled plasmas
Thin Solid Films 398-399 , pp. 652-656
Lee, Y.-J., Jeong, C.-H., Bae, J.-W., You, I.-K., Park, J.-W., Yeom, G.-Y.
[2001]
Development of a low angle forward reflected neutral oxygen beam for materials processing
Thin Solid Films 398-399 , pp. 647-651
Lee, D.H., Bae, J.W., Park, S.D., Yeom, G.Y.
[2001]
A study of transparent indium tin oxide (ITO) contact to p-GaN
Thin Solid Films 398-399 , pp. 87-92
Kim, D.W., Sung, Y.J., Park, J.W., Yeom, G.Y.
[2001]
Characteristics of He/O2 atmospheric pressure glow discharge and its dry etching properties of organic materials
Surface and Coatings Technology 146-147 , pp. 474-479
Lee, Y.-H., Yi, C.-H., Chung, M.-J., Yeom, G.-Y.
[2001]
Effect of O2(CO2)/C4F8O gas combinations on global warming gas emission in silicon nitride PECVD plasma cleaning
Surface and Coatings Technology 146-147 , pp. 522-527
Oh, B.H., Bae, J.W., Kim, J.H., Kim, K.J., Ahn, Y.S., Lee, N.E., Yeom, G.Y., (...), Cho, D.H.
[2001]
Refractive sapphire microlenses fabricated by chlorine-based inductively coupled plasma etching
Applied Optics 40 (22) , pp. 3698-3702
Park, S.H., Jeon, H., Sung, Y.J., Yeom, G.Y.
[2001]
Investigation of the outgassing characteristics of the materials comprising a plasma display panel
Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films 19 (4) , pp. 1099-1104
Han, H.R., Lee, Y.J., Yeom, G.Y.
[2001]
High rate etching of sapphire wafer using Cl2/BCl3/Ar inductively coupled plasmas
Materials Science and Engineering B: Solid-State Materials for Advanced Technology 82 (1-3) , pp. 50
Sung, Y.J., Kim, H.S., Lee, Y.H., Lee, J.W., Chae, S.H., Park, Y.J., Yeom, G.Y.
[2001]
Etch end-point detection of GaN-based devices using optical emission spectroscopy
Materials Science and Engineering B: Solid-State Materials for Advanced Technology 82 (1-3) , pp. 15
kim, H.S., Sung, Y.J., Kim, D.W., Kim, T., Dawson, M.D., Yeom, G.Y.
[2001]
Indium-tin-oxide thin film deposited by a dual ion beam assisted e-beam evaporation system
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials
Bae, J.W, Kim, J.S, Yeom, G.Y
[2001]
Characterization of an oxygen plasma by using a Langmuir probe in an inductively coupled plasma
Journal of the Korean Physical Society 38 (3) , pp. 259-263
Kim, J.S., Kim, G.H., Chung, T.H., Yeom, G.Y., Kwon, K.H.
[2001]
Dry etching characteristics of ITO thin films deposited on plastic substrates
Thin Solid Films 383 (1-2) , pp. 281-283
Lee, Y.J., Bae, J.W., Han, H.R., Kim, J.S., Yeom, G.Y.
[2001]
The Effects of surface terminal bonds and microstructure of SiO2 aerogel films on dry etching
Applied Surface Science 169-170 , pp. 457-462
Wang, S. J., Park, H. H., Yeom, G. Y., Hyun, S. H.
[2000]
Etching characteristics of lead magnesium niobate-lead titanate (PMN-PT) relaxor ferroelectrics
Surface and Coatings Technology 131 (2000) 252-256
J.W. Jang, Y.H. Lee, Y.J. Lee, J. Lee, G.Y. Yeom
[2000]
A study of lead zirconate titanate etching characteristics using magnetized inductively coupled plasmas
Surface and Coatings Technology 131 (2000) 257-260
Y.J. Lee, H.R. Han, J. Lee, G.Y. Yeom
[2000]
Tin-doped indium oxide thin film deposited on organic substrate using oxygen ion beam assisted deposition
Surface and Coatings Technology 131 (1-3) , pp. 196-200
Bae, J.W., Kim, H.J., Kim, J.S., Lee, Y.H., Lee, N.E., Yeom, G.Y., Ko, Y.W.
[2000]
A study on the etch characteristics of ITO thin film using inductively coupled plasmas
Surface and Coatings Technology 131 (1-3) , pp. 247-251
Park, J.Y., Kim, H.S., Lee, D.H., Kwon, K.H., Yeom, G.Y.
[2000]
Effects of oxygen radical on the properties of indium tin oxide thin films deposited at room temperature by oxygen ion beam assisted evaporation
Thin Solid Films 377-378 , pp. 103-108
Kim, J.S., Bae, J.W., Kim, H.J., Lee, N.-E., Yeom, G.Y., Oh, K.H.
[2000]
Properties of amorphous tin-doped indium oxide thin films deposited by O2/Ar mixture ion beam-assisted system at room temperature
Surface and Coatings Technology 131 (1-3) , pp. 201-205
Kim, H.J., Bae, J.W., Kim, J.S., Kim, K.S., Jang, Y.C., Yeom, G.Y., Lee, N.-E.
[2000]
Electrical, optical, and structural characteristics of ITO thin films by krypton and oxygen dual ion-beam assisted evaporation at room temperature
Thin Solid Films 377-378 , pp. 115-121
Kim, H.J., Bae, J.W., Kim, J.S., Kim, K.S., Jang, Y.C., Yeom, G.Y., Lee, N.-E.
[2000]
Effects of H2 Addition in Magnetized Inductively Coupled C2F6 Plasma Etching of Silica Aerogel Film
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 39 (12)
Wang, S.J., Park, H.H., Yeom, G.Y.
[2000]
Fabrication of piezoelectrically driven micro-cantilever using Pb(Zr,Ti)O3 films
IEEE International Symposium on Applications of Ferroelectrics 2 , pp. 721-724
Ahn, J., Jun, S., Kim, D., Yeom, G.Y., Yoo, J.B., Lee, J., Sands, T.
[2000]
Characteristics of magnetized inductively coupled plasma source for flat panel display applications
Surface and Coatings Technology 133-134 , pp. 612-616
Lee, Y.J., Han, H.R., Yeom, G.Y.
[2000]
Dry etch characteristics of Al-Nd films for TFT-LCD
Surface and Coatings Technology 133-134 , pp. 606-611
Han, H.R., Lee, Y.J., Yeom, G.Y., Oh, K.H., Hong, M.P.
[2000]
Magnetized inductively coupled plasma etching of GaN in Cl2/BCl3 plasmas
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 18 (4 I) , pp. 1390-1394
Lee, Y.H., Sung, Y.J., Yeom, G.Y., Lee, J.W., Kim, T.I.
[2000]
Roles of N2 gas in etching of platinum by inductively coupled Ar/Cl2/N2 plasmas
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 18 (4 I) , pp. 1377-1380
Ryu, J.H., Kim, N.H., Kim, H.S., Yeom, G.Y., Chang, E.G., Kim, C.I.
[2000]
Effects of BCl3 addition on Ar/Cl2 gas in inductively coupled plasmas for lead zirconate titanate et
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 18 (4 I) , pp. 1373-1376
An, T.H., Park, J.Y., Yeom, G.Y., Chang, E.G., Kim, C.I.
[2000]
Etching characteristics of SrBi2Ta2O9 film with Ar/CHF3 plasma
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 18 (4 I) , pp. 1354-1358
Seo, J.W., Lee, D.H., Lee, W.J., Yu, B.G., Kwon, K.H., Yeom, G.Y., Chang, E.G., Kim, C.I.
[2000]
Etching mechanism of (Ba, Sr)TiO3 films in high density Cl2/BCl3/Ar plasma
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 18 (4 I) , pp. 1381-1384
Kim, S.B., Lee, Y.H., Kim, T.H., Yeom, G.Y., Kim, C.I.
[2000]
Characterization of Yttria-Stabilized Zirconia Thin Films Prepared by Radio Frequency Magnetron Sputtering for a Combustion Control Oxygen Sensor
Journal of the Electrochemical Society 147 (6) , pp. 2380-2384
Bae, J.W., Park, J.Y., Hwang, S.W., Yeom, G.Y., Kim, K.D., Cho, Y.A., Jeon, J.S., Choi, D.
[2000]
Etch characteristics of Pt using Cl2/Ar/O2 gas mixtures
Journal of the Electrochemical Society 147 (5) , pp. 1807-1809
Kwon, K.H., Kang, S.Y., Yeom, G.Y., Hong, N.K., Lee, J.H.
[2000]
Effects of plasma conditions on the etch properties of AlGaN
Vacuum 56 (1) , pp. 45-49
Kim, H.S., Lee, D.H., Lee, J.W., Kim, T.I., Yeom, G.Y.
[2000]
Effects of oxygen ion beam plasma conditions on the properties of indium tin oxide thin films
Vacuum 56 (1) , pp. 77-81
Bae, J.W., Kim, H.J., Kim, J.S., Lee, N.E., Yeom, G.Y.
[1999]
Tin oxide films deposited by ozone-assisted thermal chemical vapor deposition
Journal of Applied Physics 85 (1) , pp. 473-477
Bae, J.W., Lee, S.W., Song, K.H., Park, J.I., Park, K.J., Ko, Y.W., Yeom, G.Y.
[1999]
Thermal stability enhancement of Cu/WN/SiOF/Si multilayers by post-plasma treatment of fluorine-doped silicon dioxide
Journal of Applied Physics 85 (1) , pp. 473-477
S.H Lee, D.J Kim, S.H Yang, J.W Park and Seil Sohn, K.H Oh, Y.T Kim, J.Y Kim, G.Y Yeom, J.W Park
[1999]
Effects of etch-induced damage and contamination on the physical and electrical properties of cobalt silicides
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 38 (10)
Kim, H.S., Yoon, J.K., Lee, Y.H., YoungWook, K.O., Park, J.W., Yeom, G.Y.
[1999]
Characteristics of inductively coupled Cl2/BCl3 plasmas during GaN etching
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 17 (4) , pp. 2214-2219
Kim, H.S., Yeom, G.Y., Lee, J.W., Kim, T.I.
[1999]
Study on surface reaction of (Ba,Sr)TiO3 thin films by high density plasma etching
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 17 (4) , pp. 2156-2162
Kim, S.B., Kim, C.I., Chang, E.G., Yeom, G.Y.
[1999]
Low-voltage characteristics of MgO-CaO films as a protective layer for AC plasma display panels by e-beam evaporation
Journal of Materials Science 34 (20) , pp. 5055-5059
Cho, J., Kim, R., Lee, K.W., Son, C., Yeom, G.Y., Kim, H.J., Kim, J.Y., Park, J.W.
[1999]
Effect of CaO addition on the firing voltage of MgO films in AC plasma display panels
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 17 (4) , pp. 1230-1234
Cho, J., Kim, R., Lee, K.W., Yeom, G.Y., Kim, J.Y., Park, J.W.
[1999]
Facet formation of a GaN-based device using chemically assisted ion beam etching with a photoresist mask
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 17 (4) , pp. 1230-1234.
Lee, W.J., Kim, H.S., Yeom, G.Y., Lee, J.W., Kim, T.I.
[1999]
Effects of variously configured magnets on the characteristics of inductively coupled plasmas
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 17 (4) , pp. 1211-1216
Hwang, S.W., Lee, Y.J., Han, H.R., Yoo, J.B., Yeom, G.Y.
[1999]
Etch characteristics of optical waveguides using inductively coupled plasmas with multidipole magnet
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 17 (4) , pp. 1483-1487
An, K.J., Lee, D.H., Yoo, J.B., Lee, J., Yeom, G.Y.
[1999]
Etch-Induced Physical Damage and Contamination during Highly Selective Oxide Etching Using C4F8/H2 Helicon Wave Plasmas
Journal of the Electrochemical Society 146 (4) , pp. 1517-1522
Kim, H.S., Lee, W.J., Yeom, G.Y., Kim, J.H., Whang, K.W.
[1999]
A study on the characteristics of inductively coupled plasma using multidipole magnets and its application to oxide etching
Thin Solid Films 341 (1) , pp. 176-179
An, K.J., Kim, H.S., Yoo, J.B., Yeom, G.Y.
[1999]
Effects of CdS substrates on the physical properties of polycrystalline CdTe films
Thin Solid Films 341 (1) , pp. 172-175
Lee, Y.H., Lee, W.J., Kwon, Y.S., Yeom, G.Y., Yoon, J.K.
[1999]
Etch-induced damage in single crystal Si trench etching by planarinductively coupled Cl2/N2 and Cl2/HBr plasmas
Thin Solid Films 341 (1) , pp. 168-171
Lee, Y.J., Hwang, S.W., Yeom, G.Y., Lee, J.W., Lee, J.Y.
[1999]
A Study of GaN etch mechanisms using inductively coupled Cl2/Ar plasmas
Thin Solid Films 341 (1) , pp. 180-183
Kim, H.S., Yeom, G.Y., Lee, J.W., Kim, T.I.
[1999]
Investigation of surface polymerization on silicon exposed to C4F8 helicon wave plasmas
Thin Solid Films 341 (1) , pp. 184-187
Lee, W.J., Kim, H.S., Yeom, G.Y., Baek, J.T.
[1998]
Effects of post annealing and oxidation processes on the removal of damage generated during the shallow trench etch process
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 37 (12)
Lee, Y.J., Hwang, S.W., Oho, K.H., Lee, J.Y., Yeom, G.Y.
[1998]
A preliminary study on the etching behavior of SiO2 aerogel film with CHF3 gas
Journal of the Korean Physical Society 33 (SUPPL. 2) , pp. S135-S137
Wang, S.J., Park, H.H., Yeom, G.Y.
[1998]
Etch characteristics of GaN using inductively coupled Cl2/Ar and Cl2/BCl3 plasmas Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 16 (3) , pp. 1478-1482 Lee, Y.H., Kim, H.S., Yeom, G.Y., Lee, J.W., Yoo, M.C., Kim, T.I.
[1998]
Etching of platinum thin films by high density Ar/Cl2/HBr plasma
Materials Research Society Symposium - Proceedings 514 , pp. 357-362
Kim, C.I., Kim, N.H., Chang, E.G., Kwon, K.H., Yeom, G.Y., Seo, Y.J
[1998]
Etch properties of gallium nitride using chemically assisted ion beam etching (CAIBE)
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 37 (12)
Lee, W.J., Kim, H.S., Lee, J.W., Kim, T.I., Yeom, G.Y.
[1998]
Effect of O2 plasma treatment on the properties of SiO2 aerogel film
Thin Solid Films 332 (1-2) , pp. 444-448
Kim, H.R., Park, H.H., Hyun, S.H., Yeom, G.Y.
[1998]
Etching properties of Pt thin films by inductively coupled plasma
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 16 (5) , pp. 2772-2776
Kwon, K.H., Kim, C.I., Yun, S.J., Yeom, G.Y.
[2020]
Nitriding process for next-generation semiconductor devices by VHF(162 MHz) multi-tile push-pull plasma source
Appl. Surf. Sci. 506, 144904
You Jin Ji, Ki Seok Kim, Ki Hyun Kim, Albert Rogers Ellingboe, Geun Young Yeom
[2020]
Effect of large work function modulation of MoS2 by controllable chlorine doping using a remote plasma
J. Mater. Chem. C
Ki Hyun Kim, Ki Seok Kim, You Jin Ji, Inyong Moon, Keun Heo, Dong-Ho Kang, Kyong Nam Kim, Won Jong Yoo, Jin-Hong Park and Geun Young Yeom
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